Understanding and Controlling Defects, Disorder and Electronic Transport in High Mobility Perovskite Oxides

非技术描述：该项目的重点是使用先进的薄膜沉积技术合成一类新的氧化物材料。这些材料具有高导电性和宽带隙-因此光可以很容易地通过，使其光学透明。这些性质对于下一代电子设备如高功率电子设备、透明显示器、触摸屏和太阳能电池具有极大的兴趣。研究活动通过教育、培训和实践讲习班，为当地高中、少数群体组织和社区学院的学生的专业发展经验作出贡献。技术规格：通过实验和计算技术相结合，该项目正在研究基本因素，在原子水平的细节，影响应变工程碱土锡酸盐（Sr 1-xSnO 3）薄膜的缺陷形成和电子特性。特别是，该项目正在寻求理解和控制这些材料中的缺陷，特别是位错，局部结构和电子迁移率，最终目标是创造一类新的具有宽带隙的高迁移率半导体材料，用于室温应用。该项目还开发了用于控制复杂氧化物中的点缺陷和结构缺陷的原子级合成方法。该项目为研究生，本科生和高中生提供机会，以获得尖端薄膜沉积方法，先进的表征技术和理论计算方面的培训。

NON-TECHNICAL DESCRIPTION: This project focuses on the synthesis of a new class of oxide materials using an advanced state-of-the-art thin film deposition technique. These materials possess high conductivity and a wide bandgap - so light can pass through easily, making it optically transparent. These properties are of great interest for next generation electronic devices such as high-power electronics, transparent displays, touchscreens and solar cells. The research activities contribute to the professional development experience for students from local high schools, minority organizations and community colleges through education, training and hands-on workshops. TECHNICAL DETAILS: Through a combination of experimental and computational techniques, the project is investigating fundamental factors, at the atomic level of detail, that influence the defect formation and electronic properties in strain-engineered alkaline-earth stannate (Sr1-xBaxSnO3) thin films. In particular, the project is seeking to understand, and control defects specifically dislocations, local structure, and electronic mobility in these materials with an ultimate goal to create a new class of high-mobility semiconducting materials with wide bandgap for room-temperature applications. The project is also exploiting synthesis methods for atomic level control of point defects and structural defects in complex oxides. The project is providing opportunities for graduate, undergraduate and high school students to obtain training on cutting-edge thin film deposition approaches, advanced characterization techniques, and theoretical calculations.