MRI: Acquisition of Electron Beam Lithography System for Next-Generation Nanomanufacturing and Education

这个主要的研究仪器项目是获得一个电子束光刻系统，以支持俄亥俄州州立大学（OSU）和周边地区的研究和教育活动。在纳米尺度上精确地创建图案的能力是科学、工程和医学进步的关键推动力。电子束光刻系统使用精确聚焦的电子束来实现仅几纳米大小的图案。这些特征可以用来研究新的科学现象，创造新的结构，并设计技术解决方案。俄勒冈州立大学和该地区的研究人员将利用该系统研究广泛的主题。主题包括材料中的量子现象，量子通信，高性能电子和医学应用。该系统将被放置在一个集中的纳米工厂设施中，以确保设备的长期可持续性，并向大学内外的广泛用户开放。该工具将允许大量用户将最先进的图案化技术应用于教育，科学，工程和产品开发。该系统将用于培训俄亥俄州和其他教育机构的本科生和研究生。一个推广计划将使哥伦布大都市地区学校的学生和教师与研究人员接触。高中生将学习波，光学和电子学的基本科学概念如何通过实践项目和图尔斯参观俄亥俄州州立大学的洁净室设施连接到现实生活中的应用。现代最先进的电子束光刻系统的收购将刺激一系列领域的研究，包括二维材料电子学和力学，红外传感器，集成光子学，高频电子学，量子通信、冶金、地球科学和医学研究。受影响的研究项目将导致我们在纳米尺度上对材料和系统的基本物理特性的理解，以及这些材料中的新的电子，磁性和光学现象的进步。一系列具有重大经济和社会影响的技术和应用将受益于拟议的电子束光刻系统的可用性，这将在多个方向实现颠覆性创新，包括下一代高数据速率通信系统，医疗成像，安全和空间遥感应用，量子信息系统，医疗应用细胞工程，该奖项反映了NSF的法定使命，并通过使用基金会的知识价值和更广泛的影响审查标准进行评估，被认为值得支持。

This major research instrumentation project is to acquire an electron beam lithography system to support research and education activities at The Ohio State University (OSU) and surrounding regions. The ability to create patterns precisely and accurately at the nanometer scale is a key enabler for advances in science, engineering, and medicine. Electron beam lithography systems use precisely focused beams of electrons to realize patterns only a few nanometers in size. Such features can be used to study new scientific phenomena, create novel structures, and to engineer technology solutions. Researchers at OSU and in the region will research a broad range of topics with the system. Topics include quantum phenomena in materials, quantum communications, high-performance electronics, and medical applications. The system will be placed in a centralized nanofabrication facility that will ensure long-term sustainability of the equipment, and open access to a broad range of users within and outside the university. The tool will allow a large number of users to apply state-of-art patterning technology for education, science, engineering, and product development. The system will be used to train undergraduate and graduate students at Ohio State and other educational institutions. An outreach program will engage students and teachers from schools in the Columbus metropolitan region with researchers. High school students will learn how fundamental science concepts in waves, optics and electronics connect to real-life applications through hands-on projects and tours of clean room facilities at Ohio State University.Acquisition of a modern state-of-art electron beam lithography system would spur research in a range of areas, including 2-dimensional material electronics and mechanics, infrared sensors, integrated photonics, high-frequency electronics, quantum communication, metallurgy, earth sciences, and medical research. The impacted research projects would lead to advances in our understanding of fundamental physical properties of materials and systems at the nanometer scale, and of novel electronic, magnetic, and optical phenomena in these materials. A range of technologies and applications with significant economic and societal impact will benefit from the availability of the proposed electron beam lithography system, which will enable disruptive innovation in several directions including next-generation high data rate communication systems, imaging for medical, security, and space remote-sensing application, quantum information systems, cell engineering for medical applications, and new semiconductor materials for energy-efficient power electronics and computing.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.