Thin film X-ray diffractometer

申请的薄膜X射线衍射仪应在化学系集中操作，并将提供给来自化学，物理和工程的广泛用户群，其中包括处理晶体氧化物，配位化合物和薄膜形式的混合材料。该器件能够进行高质量的相位分析、X射线反射测量以及晶体薄膜和浮动和液体薄膜样品的面内测量，还可以跟踪薄膜的温度依赖性结晶过程。该设备还配备了一个强大的旋转阳极。因此，结构形成过程和合成材料改性以及相关的结晶度和取向变化都可以通过特别精确和快速的测量进行研究，以便更深入地了解对光电化学或电催化活性的影响。

The thin film X-ray diffractometer applied for should be operated centrally in the chemistry department, and will be available to a broad user group from chemistry, physics and engineering who, among other things, deals with crystalline oxides, coordination compounds and hybrid materials in the form of thin films. The device enables measurements for high-quality phase analysis, X-ray reflectometry, and in-plane measurements of crystalline thin films and floating and liquid thin film samples, with the additional possibility of tracking temperature-dependent crystallization processes of thin films. The device is also equipped with a powerful rotating anode. As a result, both structure formation processes and synthetically-made material modifications and the associated changed crystallinity and orientation can be investigated through particularly precise and fast measurements in order to gain a deeper understanding of the influence on e.g. photoelectrochemical or electrocatalytic activity.