Study of polymer thin films for processing of metal thin films in thermal nanoimprint lithography

为了科学地理解反应单分子膜辅助热压印光刻技术，利用光反应吸附单层膜在抗蚀剂聚合物与金属界面形成化学共价键，研究了具有抗蚀剂性能的热塑性聚合物薄膜，该薄膜适合于金属薄膜的湿法加工。我们展示了有效地接枝到光反应基团上的热塑性聚合物的种类，适合于金属湿法刻蚀和电沉积的热塑性聚合物的种类及其最佳分子量，蚀刻水溶液通过抗蚀剂聚合物薄膜的分子量依赖的渗透行为，以及荧光抗蚀剂在通过热纳米压印显示抗蚀剂薄膜图案化形状方面的有用性。

Thermoplastic polymer thin films showing resist property suitable for wet processing of metal thin films on substrates were studied for scientific understanding of reactive-monolayer-assisted thermal nanoimprint lithography using photoreactive adsorbed monolayers which form chemical covalent bonds at resist polymer and metal interface. We demonstrated the kind of thermoplastic polymers effectively grafted to photoreactive groups, the kind of thermoplastic polymer and its optimum molecular weight suitable for metal wet etching and electrodeposition, molecular-weight-dependent permeation behavior of etching aqueous solution through resist polymer thin film, and usefulness of fluorescent resist to visualize patterned shapes of resist thin films by thermal nanoimprinting.