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CRYSTAL STRUCTURE ANALYSIS OF SURFACE AND INTERFACE 1 ATOMIC LAYER AND CONTROL OF HETEROSTRUCTURE GROWTH

CRYSTAL STRUCTURE ANALYSIS OF SURFACE AND INTERFACE 1 ATOMIC LAYER AND CONTROL OF HETEROSTRUCTURE GROWTH
表面和界面1原子层的晶体结构分析及异质结构生长的控制
批准号:
09305003
负责人:
TAKEDA Yoshikazu
金额:
$24.9万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1997
资助国家:
日本
项目状态:
已结题
起止时间:
1997 至 1999

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中文摘要
翻译
The targets of this research are to establish a technique to measure and analyze the crystal structures of surface and interface monolayer in semiconductor in situ,and to control the heterostructure growth,not only semiconductor/semiconductor heterostructures but also other combinations such as semiconductor/insulator and semiconductor/semimetal heterostructures but also other combinations such as semiconductor/semimetal heterostructures but als.It was also found the semimetal changes to semiconductor due to the quantum size effects.By the X-ray CTR scattering measurements,the compositions,the layer thicknesses and the interface structures of InP/InGaAs(2-3monolayer)/InP heterostructures were measured and revealed to the one atomic layer level.The observation of one atomic layer of AlAs(1monolayer)on GaAs was successfully made by X-ray ccessfully made by X-ray CTR scattering.Together with the interface structure analysis in…More InP/InGaAs/InP and the observation of surface 1 monolayer of AlAs,the original targets were achieved in this research.The X-ray CTR scattering measurement technique that has demonstrated its very powerful capability to reveal the crystal structures of 1atomic layer in heterostructures was applied to the low-temperature buffer layers for growth of GaN on apphire substrates.The growth process and growth timing dependences of the crystalline structures of the low-temperature AlN and GaN buffer layers were revealed by the X-ray CTR scattering measurements,X-ray reflectivity measurements and AFM surface observations.The role of the low-temperature buffer layers and the best crystallinity as the buffer layers were clarified in the atomic scale.Through the establishments of the characterization techniques and the analysis of these heterostructures,a completely new heterostructure,i.e.,CaF I D22齐埃D2/InAs/CaF I D22齐埃D2,were proposed and started to fabricate by a newly designed molecular beam beam epitaxy。Less:Less
英文摘要
The targets of this research are to establish a technique to measure and analyze the crystal structures of surface and interface monolayer in semiconductor in situ, and to control the heterostructure growth, not only semiconductor/semiconductor heterostructures but also other combinations such as semiconductor/insulator and semiconductor/semimetal heterostructures.InP/ErP/InP heterostructures were successfully fabricated and the crystal structure of ErP was proved to be the rocksalt structure by CTR scattering measurement. It was also found the semimetal changes to semiconductor due to the quantum size effects.By the X-ray CTR scattering measurements, the compositions, the layer thicknesses and the interface structures of InP/InGaAs (2-3 monolayer) /InP heterostructures were measured and revealed to the one atomic layer level.The observation of one atomic layer of AlAs (1 monolayer) on GaAs was successfully made by X-ray CTR scattering. Together with the interface structure analysis in … More InP/InGaAs/InP and the observation of surface 1 monolayer of AlAs, the original targets were achieved in this research.The X-ray CTR scattering measurement technique that has demonstrated its very powerful capability to reveal the crystal structures of 1 atomic layer in heterostructures was applied to the low-temperature buffer layers for growth of GaN on sapphire substrates. The growth process and growth timing dependences of the crystalline structures of the low-temperature AlN and GaN buffer layers were revealed by the X-ray CTR scattering measurements, X-ray reflectivity measurements and AFM surface observations. The role of the low-temperature buffer layers and the best crystallinity as the buffer layers were clarified in the atomic scale.Through the establishments of the characterization techniques and the analysis of these heterostructures, a completely new heterostructure, i.e., CaFィイD22ィエD2/InAs/CaFィイD22ィエD2, were proposed and started to fabricate by a newly designed molecular beam epitaxy. Less
期刊论文(0)
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会议论文
竹田、藤田 他: "Monolayer scale analysis of ZnSe/GaAs in heterointerfaces structures by x-ray CTR scattering and interference" Inst.Phys.Conf.Ser.156. 263-266 (1998)
Takeda、Fujita 等人:“通过 X 射线 CTR 散射和干涉对异质界面结构中的 ZnSe/GaAs 进行单层尺度分析”Inst.Phys.Conf.Ser.156 (1998)。
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通讯作者:
S.Fuchi: "Self-assembled InGaAs dots grown on GaP (001) substrate by low pressure organometallic vapor phase epitaxy."Physica. E. (印刷中). (2000)
S.Fuchi:“通过低压有机金属气相外延在 GaP (001) 衬底上生长的自组装 InGaAs 点”。E.(出版中)。
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Y.Nonogaki: "SR-stimulated etching and OMVPE growth for semiconductor nanostructure fabrication."Msaterials Science and Engineering B. (印刷中). (2000)
Y. Nonogaki:“用于半导体纳米结构制造的 SR 刺激蚀刻和 OMVPE 生长”。材料科学与工程 B.(出版中)。
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通讯作者:
田渕,竹田 他: "Thermal diffusion of Er atoms δ-doped in InP" Appl.Sur.Sci.(印刷中).
Tabuchi、Takeda 等人:“InP 中 δ 掺杂的 Er 原子的热扩散”Appl.Sur.Sci.(出版中)。
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共 23 条
    Improvement of quantum efficiency of super-high brightness and high spin-polarization photocathodes
    Intrinsic Hetero-interface Structures and Their Formation
    • 批准号:
      18106001
    • 项目类别:
      Grant-in-Aid for Scientific Research (S)
    • 资助金额:
      $74.38万
    • 财政年份:
      2006
    • 负责人:
      TAKEDA Yoshikazu
    • 依托单位:
    Fabrication of Semiconductor Light Amplifier using Ultra-High Co-Doping of Er and O
    • 批准号:
      13305022
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $27.54万
    • 财政年份:
      2001
    • 负责人:
      TAKEDA Yoshikazu
    • 依托单位:
    RESEARCH ON ATOMIC LAYER CONTROLLED GROWTH AND CHARACTERIZATION OF SEMICONDUCTOR QUANTUM STRUCTURES WITH DIFFERENT GROUP-V ATOMS
    • 批准号:
      07455007
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $5.38万
    • 财政年份:
      1995
    • 负责人:
      TAKEDA Yoshikazu
    • 依托单位:
    海外基金