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Urgently Needed Reactive Sputtering Deposition System for Strategic Thin-Film Materials in Microsystems and to Replace a Non-Functional Evaporator

Urgently Needed Reactive Sputtering Deposition System for Strategic Thin-Film Materials in Microsystems and to Replace a Non-Functional Evaporator
微系统中战略薄膜材料急需的反应溅射沉积系统并取代无功能的蒸发器
批准号:
472787-2015
负责人:
Nabki, Frederic
金额:
$10.91万
依托单位国家:
加拿大
项目类别:
Research Tools and Instruments - Category 1 (<$150,000)
财政年份:
2014
资助国家:
加拿大
项目状态:
已结题
起止时间:
2014-01-01 至 2015-12-31

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中文摘要
翻译
该提案的目标是获得一个反应溅射系统(RSS),以取代旧的蒸发器,这是不起作用,并提高我们的薄膜沉积能力。这RSS将恢复我们的能力,存款金属薄膜,这是至关重要的,我们的研究活动,并将打开大门,沉积其他战略材料的制造与集成微波器件,微机电系统,集成光子学,微电池和有机光电子学的应用。
英文摘要
The goal of this proposal is to acquire a reactive sputtering system (RSS) to replace an old evaporator which is not functional and to enhance our thin-film deposition capabilities. This RSS will restore our ability to deposit metallic thin-films that are critical to our research activities and will open the door to the deposition of other strategic materials for the fabrication of novel microsystems with applications in integrated microwave devices, microelectromechanical systems, integrated photonics, microbatteries, and organic optoelectronics.
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