Expedited Award for Novel Research: Real Space Transfer Dual Switching Field Effect Transistors using III-V Modulation Doped Heterostructures
新颖研究加急奖:使用 III-V 调制掺杂异质结构的真实空间传输双开关场效应晶体管
基本信息
- 批准号:8617801
- 负责人:
- 金额:$ 3万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:1986
- 资助国家:美国
- 起止时间:1986-09-15 至 1988-02-29
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
The PI will carry out collaborative research activities with the Electronics Technology and Devices Laboratory (ETDL) at Fort Monmouth, New Jersey involving the design, fabrication, modelling and characterization of a novel real-space transfer switching MODFET device structure. The design details of the test device structure will be jointly developed between the two laboratories. The actual device fabrication work will be carried out at the ETDL with direct participation of a senior graduate student from PSU who will stay in Fort Monmouth area on a temporary basis.
PI将与以下机构开展合作研究活动: 电子技术和器件实验室(ETDL)在蒙茅斯堡, 新泽西涉及设计,制造,建模和 一种新型实空间转移开关MODFET器件的特性 结构 测试装置结构的设计细节将在 由两个实验室共同开发。 实际设备 制造工作将在ETDL进行, 一名来自PSU的高年级研究生的参与, 暂时驻扎在蒙茅斯堡地区。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Mukunda Das其他文献
Mukunda Das的其他文献
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{{ truncateString('Mukunda Das', 18)}}的其他基金
"Structural and Performance Limitations of Ultra-Submicron Gate-length Modulation-Doped FET's Based on InP Substrate for MM-Wave Amplification"
“用于毫米波放大的基于 InP 衬底的超亚微米栅极长度调制掺杂 FET 的结构和性能限制”
- 批准号:
8921694 - 财政年份:1990
- 资助金额:
$ 3万 - 项目类别:
Continuing Grant
Fabrication and Characterization of Selectively Contacted Dual Channel Switching Transistors Using III-V Modulation- Doped Heterostructures - Ft. Monmouth
使用 III-V 调制掺杂异质结构的选择性接触双通道开关晶体管的制造和表征 - Ft.
- 批准号:
8913743 - 财政年份:1989
- 资助金额:
$ 3万 - 项目类别:
Standard Grant
Design and Performance Evaluation of 0.1 um Gate-Length Modulation-Doped FET's for Millimeter-Wave Amplification
用于毫米波放大的 0.1 um 栅极长度调制掺杂 FET 的设计和性能评估
- 批准号:
8714972 - 财政年份:1988
- 资助金额:
$ 3万 - 项目类别:
Continuing Grant
Fort Monmouth Interaction: Fabrication and Characterization of Real-Space Transfer Dual Switching Field-Effect Using III-V Modulation-Doped Heterostructures
Fort Monmouth Interaction:使用 III-V 调制掺杂异质结构的真实空间传输双开关场效应的制造和表征
- 批准号:
8718801 - 财政年份:1988
- 资助金额:
$ 3万 - 项目类别:
Standard Grant
IUC: A Study of the Basic Characteristics of Submicron Gate-length Superlattice Stabilized Modulation-doped FET's Optimized for Improved MM-wave Performance
IUC:亚微米栅长超晶格稳定调制掺杂 FET 基本特性的研究,经优化可提高毫米波性能
- 批准号:
8503894 - 财政年份:1985
- 资助金额:
$ 3万 - 项目类别:
Continuing Grant
Industry/University Cooperative Research Activity: An Investigation of the Backgating Effect and the 1/f Noise in GaAs MESFET'S
产学合作研究活动:GaAs MESFET 中的背栅效应和 1/f 噪声的研究
- 批准号:
8401182 - 财政年份:1984
- 资助金额:
$ 3万 - 项目类别:
Standard Grant
I/Ucra: an Exper. Study For the Characterization of DefectsAnd Imperfections in Gaas Field-Effect Transistors With Emph. on Their Origin in Materials and Processing
I/Ucra:专家。
- 批准号:
8103737 - 财政年份:1982
- 资助金额:
$ 3万 - 项目类别:
Standard Grant
Industry/University Cooperative Program-Processing Defects In Field Effect Transistors
产学合作项目——场效应晶体管缺陷处理
- 批准号:
7824428 - 财政年份:1979
- 资助金额:
$ 3万 - 项目类别:
Standard Grant
Special Foreign Currency Travel Award (Including Indian Currency) For Participation in the U.S.-India Exchange of Scientists Program
参加美印科学家交流计划特别外币旅行奖(包括印度货币)
- 批准号:
7723636 - 财政年份:1978
- 资助金额:
$ 3万 - 项目类别:
Standard Grant
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