Chemical Vapor Deposition of Early Transition - Metal Nitrides

早期转变的化学气相沉积 - 金属氮化物

• 批准号: 8802306
• 负责人: Roy Gordon
• 金额: $ 41.72万
• 依托单位: Harvard University
• 依托单位国家: 美国
• 项目类别: Continuing Grant
• 财政年份: 1988
• 资助国家: 美国
• 起止时间: 1988-08-15 至 1992-01-31
• 项目状态: 已结题
• 来源: https://www.nsf.gov/awardsearch/showAward?AWD_ID=8802306&HistoricalAwards=false
• 关键词: Chemical; Vapor; Deposition; Early; Transition

This research is being jointly supported by the Office of Special Projects in the Chemistry Division and the Ceramics and Electronic Materials Program in the Division of Materials Research under the Materials Chemistry Initiative at the National Science Foundation. The research under this grant concentrates on the synthesis and use of novel precursor molecules of inorganic and organometallic imido complexes for chemical vapor deposition of Group IV and V transition metal nitride thin films. These molecules have several desirable features which will be explored, e.g. the presence of one preformed metal-nitrogen multiple chemical bond per metal atom, ancillary functional groups which have decomposition pathways at temperatures below 4000 centigrade. The structure and quality of the films are being determined using an electron microprobe for micro- chemical analysis, Rutherford Back-scattering for depth profiling of chemical composition, Auger electron spectroscopy for chemical bonding and chemical analysis, secondary ion mass spectroscopy for chemical analysis, photoelectron spectroscopy for chemical bonding, and x-ray diffraction for crystallographic characterization. The Group IV and V nitrides have unique combinations of properties that make them technologically important. However, their application is limited by the absence of processing techniques to apply thin films of high quality at high rates of deposition and low temperatures. The research being done under this grant will emphasize the discovery and synthesis of precursor compounds that will make organometallic chemical vapor deposition of these nitrides technologically feasible.

这项研究得到了联合国人权事务高级专员办事处的联合支持。 化学系和陶瓷系的特别项目， 材料系电子材料专业 美国国家科学院材料化学研究计划（Materials Chemistry Initiative at the National 科学基金会。 该基金的研究集中在 新型前体分子的合成和应用 用于化学蒸气无机和有机金属亚胺络合物 IV族和V族过渡金属氮化物薄膜的沉积。 这些分子具有几个期望的特征， 探索，例如，存在一种预先形成的金属-氮 每个金属原子有多个化学键，辅助功能的 在低于100 ℃的温度下具有分解途径的基团 4000摄氏度。 薄膜的结构和质量 使用电子显微探针进行微- 化学分析，卢瑟福背散射深度剖析 俄歇电子能谱法 键合和化学分析，二次离子质谱 用于化学分析的光电子能谱 键合和x射线衍射 特征化 IV族和V族氮化物具有以下独特的组合： 使其具有重要的技术价值。 然而，在这方面， 它们的应用受到缺乏处理的限制， 技术应用高质量的薄膜在高速率的 沉积和低温。 这项研究是在 该基金将重点关注以下方面的发现和合成： 有机金属化合物的前体化合物 这些氮化物的沉积在技术上是可行的。