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Femtosecond Pulsed Laser-Assisted Ultrafine Machining of Chemical Vapor Deposited Diamond Films

Femtosecond Pulsed Laser-Assisted Ultrafine Machining of Chemical Vapor Deposited Diamond Films
飞秒脉冲激光辅助化学气相沉积金刚石薄膜超精细加工
批准号:
9622518
负责人:
Ajay Malshe
金额:
$25.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-09-15 至 1999-08-31

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中文摘要
翻译
粤ICP备16025518号-1 马尔谢 化学气相沉积(CVD)金刚石沉积已经增强了用于电子、光学、计算机和机械工业的许多现有技术系统的操作性能。 以前,能量源,如离子,磨料和化学被认为是CVD金刚石膜的合成后精加工和机械加工。 这些技术不可避免地导致表面和次表层的污染和损坏,如残余应力、化学品残留物和缺陷。 这些技术中的许多是基于直接在基板上施加固体、液体或气体抛光。 这些技术的结果是缓慢的,从而导致损坏和恶化。 本研究开发并研究一种新颖的飞秒(fs)脉冲激光加工技术,用于CVD金刚石薄膜和其他CVD金刚石基部件的超细加工。 研究人员提出,紫外线(UV)波长,脉冲宽度和加工环境与这种新方法的正确组合不仅可以改进现有的激光加工技术,而且还可以超越所有其他现有的物理化学加工技术。 这项研究任务是与爱荷华州州立大学合作进行的。
英文摘要
DMI-9622518 Malshe Chemical Vapor Deposited (CVD) diamond deposition has enhanced the operating performance of many existing technological systems for the electronics, optical, computer and mechanical industries. Previously, energy sources such as ions, abrasive, and chemical was considered for post-synthesis finishing and machining of CVD-diamond films. These techniques inevitably lead to contamination and damage to the surfaces and subsurface layers as residual stresses, chemicals residues, and defects. Many of these techniques were based on applying a solid, liquid, or gas polish directly on the substrate. The results of these techniques are slow, thereby resulting in damage and deterioration. This research develops and investigates a novel femtosecond (fs) pulse laser processing technique for ultrafine machining of CVD-diamond films and other CVD-diamond based components. The investigators proposes that the right combination of ultraviolet (UV) wavelength, pulse width, and processing environment with this novel approach will not only refine existing laser-processing techniques, but also surpass all other existing processing techniques in their physico-chemical machining performances. The research task is in collaboration with the Iowa State University.
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