MRI: Development of an Intense Table-Top Soft X-Ray Laser Source of Picosecond Pulses
MRI:开发皮秒脉冲强台式软 X 射线激光源
基本信息
- 批准号:9977677
- 负责人:
- 金额:$ 53.07万
- 依托单位:
- 依托单位国家:美国
- 项目类别:Standard Grant
- 财政年份:1999
- 资助国家:美国
- 起止时间:1999-10-01 至 2005-09-30
- 项目状态:已结题
- 来源:
- 关键词:
项目摘要
9977677RoccaThis project will develop a table-top soft x-ray laser source of very intense pulses of picosecond duration. The important enabling role of intense soft x-ray coherent radiation in science and technology is well recognized, and has motivated the development of large modem synchrotron radiation facilities. Very recent advances now allow the possibility to develop compact table-top sources of soft x-ray laser radiation with a spatially coherent average power similar to that of a synchrotron beam line, and with more that five orders of magnitude larger peak power. Such table-top sources could greatly impact the national research infrastructure by making intense beams of soft x-ray radiation more widely available, and by enabling new science with the access to a regime of very high soft x-ray peak intensities not presently available.The project will develop a new kind of powerful table-top soft x-ray laser based in the combination of capillary discharges developed in our laboratory with high intensity ultrashort pulse optical laser technology. The combination of these two relatively new but proven technologies should allow the efficient generation of multi-Megawatt picosecond pulses of highly coherent soft x-ray radiation at a variety of soft x-ray wavelengths. The use of a capillary discharge plasma waveguide will allow the PI to make very efficient use of the laser pump radiation, potentially improving the efficiency of laser pumped collisional soft x-ray lasers by one to two orders of magnitude. The major concepts that will enable the proposed research development have been tested experimentally. The proposed development has potential, in collaboration with industry, to make these table-top lasers accessible to a broad community of scientists and engineers nationwide.***
9977677RX100该项目将开发一个桌面软X射线激光源,其脉冲非常强,持续时间为皮秒。 强软x射线相干辐射在科学技术中的重要作用是众所周知的,并推动了大型现代同步辐射设施的发展。 最近的进展现在允许开发紧凑的桌面软X射线激光辐射源,其空间相干平均功率类似于同步加速器光束线的功率,并且峰值功率大五个数量级。 这样的桌面光源可以使软X射线辐射的强光束更广泛地使用,并通过使新的科学能够获得目前无法获得的非常高的软x射线峰值强度。该项目将开发一种新的强大的桌面软x射线,利用本实验室研制的毛细管放电与高强度超短脉冲光激光技术相结合的方法,研制了一种新型的超短脉冲光激光器。 这两种相对较新但经过验证的技术的组合应该允许在各种软X射线波长下有效地产生高度相干的软X射线辐射的多兆瓦皮秒脉冲。 毛细管放电等离子体波导的使用将允许PI非常有效地利用激光泵浦辐射,潜在地将激光泵浦碰撞软X射线激光器的效率提高一到两个数量级。 主要的概念,将使拟议的研究开发已经过实验测试。 拟议的开发有可能与工业界合作,使这些台式激光器能够被全国范围内的科学家和工程师广泛使用。
项目成果
期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)
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Jorge Rocca其他文献
Ponderomotive acceleration with high energy tilted ultrafast laser pulses
高能倾斜超快激光脉冲有质动力加速
- DOI:
- 发表时间:
2023 - 期刊:
- 影响因子:0
- 作者:
Patrick Hunt;Alex M. Wilhelm;Shoujun Wang;R. Hollinger;Ze’ev Shpilman;S. Z. Anaraki;Aaron Davenport;Daniel E. Adams;C. Menoni;Jorge Rocca;Charles Durfee - 通讯作者:
Charles Durfee
Jorge Rocca的其他文献
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{{ truncateString('Jorge Rocca', 18)}}的其他基金
PFI-TT: Enhancing the Mass Production of Advanced Integrated Circuits
PFI-TT:增强先进集成电路的量产
- 批准号:
2141227 - 财政年份:2022
- 资助金额:
$ 53.07万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1852537 - 财政年份:2019
- 资助金额:
$ 53.07万 - 项目类别:
Standard Grant
PFI:AIR - TT: Pulse Shaping for Increased Conversion Efficiency in Extreme Ultraviolet Lithography Sources for the Fabrication of Next Generation Integrated Circuits
PFI:AIR - TT:脉冲整形可提高极紫外光刻源的转换效率,用于制造下一代集成电路
- 批准号:
1701238 - 财政年份:2017
- 资助金额:
$ 53.07万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1461231 - 财政年份:2015
- 资助金额:
$ 53.07万 - 项目类别:
Standard Grant
OP: Transforming Table-top Soft X-Ray Lasers into High Average Power Devices
OP:将台式软 X 射线激光器转变为高平均功率设备
- 批准号:
1509925 - 财政年份:2015
- 资助金额:
$ 53.07万 - 项目类别:
Standard Grant
NSF EUV ERC RET in Engineering & Computer Science Site Program
NSF EUV ERC RET 工程
- 批准号:
1301436 - 财政年份:2014
- 资助金额:
$ 53.07万 - 项目类别:
Standard Grant
AIR Option 2: Research Alliance - Development of key technology for next generation projection lithography of integrated circuits at 6.X nm wavelength
AIR选项2:研究联盟——开发下一代6.X nm波长集成电路投影光刻关键技术
- 批准号:
1343456 - 财政年份:2013
- 资助金额:
$ 53.07万 - 项目类别:
Standard Grant
REU Site: Engineering Applications of Extreme Ultra-Violet (EUV) Laser Light
REU 网站:极紫外 (EUV) 激光的工程应用
- 批准号:
1157036 - 财政年份:2012
- 资助金额:
$ 53.07万 - 项目类别:
Continuing Grant
High Energy Density Plasmas in Ultrafast Micro-Capillary Discharges
超快微毛细管放电中的高能量密度等离子体
- 批准号:
1004295 - 财政年份:2010
- 资助金额:
$ 53.07万 - 项目类别:
Continuing Grant
MRI-R2: Development of a high average power table-top extreme ultraviolet/soft x-ray laser beam line for science at the nanoscale
MRI-R2:开发用于纳米级科学的高平均功率台式极紫外/软 X 射线激光束线
- 批准号:
0960274 - 财政年份:2010
- 资助金额:
$ 53.07万 - 项目类别:
Standard Grant
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