Ligand Control in CVD of Nanostructured Materials

这一奖项授予明尼苏达大学双子城分校的韦恩·格拉德菲尔特教授，是对先前奖项的延续，并得到了化学部的先进材料和加工计划以及材料研究部的电子材料计划的支持。研究的重点将是研究从无水金属硝酸盐中化学气相沉积单金属和多金属氧化物薄膜。该奖项还将评估配体控制的沉积过程的动力学和微观机理，并研究确定沉积机理之间的关系。该奖项的另一个组成部分是多组分氧化物的原子层化学气相沉积研究。此外，这项研究将在材料化学的一个重要交叉学科领域为学生提供培训。该奖项将研究沉积过程中配体控制的动力学和微结构机理，并研究在化学气相沉积过程中沉积机理与薄膜成分之间的关系。利用化学气相沉积和原子层化学气相沉积的方法制备了各种金属氧化物薄膜，这些非晶态高介电常数材料可用于制备具有可调谐电学和光子特性的薄膜。此外，该研究项目将为学生提供丰富的多学科材料化学教育和培训机会。

This award to Professor Wayne Gladfelter of the University of Minnesota-Twin Cities is a renewal of an earlier award and is supported by the Advanced Materials and Processing Program in the Chemistry Division and the Electronic Materials Program in the Division of Materials Research. The focus of the research will be to study the chemical vapor deposition of mono- and multimetal oxide films from anhydrous metal nitrates. The award also will evaluate the ligand controlled kinetics and microstructure mechanism of the deposition processes, and studies to determine relationship between the deposition mechanism. Another component of the award is the study of atomic layer chemical vapor deposition of multicomponent oxide. In addition, the research will provide training to students in an important interdisciplinary area of materials chemistry.This award will study the ligand controlled kinetics and microstructure mechanism of the deposition processes, and studies to determine relationship between the deposition mechanism and film composition during the chemical vapor deposition. Various thin metal oxide films will be prepared by chemical vapor deposition and atomic layer chemical vapor deposition under this program and these amorphous high dielectric materials may be used for the fabrication of thin films with tunable electronic and photonic properties. In addition, the research program will provide a rich multidisciplinary education and training opportunity to students in material chemistry.