Epitaxial Oxides by ALD

ALD 外延氧化物

基本信息

  • 批准号:
    0932834
  • 负责人:
  • 金额:
    $ 25.91万
  • 依托单位:
  • 依托单位国家:
    美国
  • 项目类别:
    Standard Grant
  • 财政年份:
    2009
  • 资助国家:
    美国
  • 起止时间:
    2009-09-01 至 2013-08-31
  • 项目状态:
    已结题

项目摘要

0932834WillisThis award is funded under the American Recovery and Reinvestment Act of 2009 (Public Law 111-5).The PI is planning an experimental research program to investigate the growth of epitaxial crystalline oxide layers on semiconductor substrates by atomic layer deposition. Crystalline oxides are an important class of materials that exhibit a rich variety of functional electronic, magnetic, and optical properties, including ferroelectricity, pyroelectricity, piezoelectricity, and ferromagnetism. In addition, oxides can be doped like elemental and compound semiconductors and they can be insulating, conducting, semiconducting, and superconducting. In order to realize the full promise of crystalline oxides, it is necessary to advance the growth engineering, and integrate oxides with semiconductor substrates to make hybrid semiconductor/ crystalline oxide devices. The PI's process is based on the unique properties of the alkaline earth metal oxides and the precision of atomic layer deposition to grow epitaxial oxides on semiconductor substrates including Si, Ge, and GaAs. The process has several advantages over the existing state-of-the-art that is based on molecular beam epitaxy. These advantages include process economics including increased throughput, and lower capital and operating costs, as well as simplifications of the processing due to unique aspects of the atomic layer deposition chemistry. Successful execution of the research program will lead to transformative impacts on the field of electronic materials by enabling a new class of devices based on oxide electronics, and stimulating industrial interest. The intellectual merits of the research are to discover a reactive process based on fundamental chemical interactions and atomic layer deposition to grow epitaxial oxides on semiconductor substrates. The research could advance the knowledge of deposition processes, surface reactions, and materials engineering. It utilizes state-of-the-art concepts in electronic materials and advances the capability for engineering a useful class of materials. The research will also advance understanding of the chemical and structural interactions at semiconductor/ oxide interfaces, which are of interest to modern microelectronics technology. The broader impacts of the research include technology advancement, K-12 education enhancement, and outreach to underrepresented groups. The PI plans an outreach program that will impact high school teachers, high school students, and underrepresented and underprivileged student populations. He will develop a workshop based on microelectronics for the da Vinci program at UConn to provide an inspirational and learning experience for high school teachers from diverse backgrounds. The program will reach out to the Magnet schools of Hartford to promote the underutilized talents of inner city teachers and students. The work will also educate a PhD graduate student and provide research experiences for undergraduate students. Lastly, the work will be integrated into teaching as an educational vehicle for Chemical Engineering and Materials Science students.
0932834 Willis该奖项是根据2009年美国复苏和再投资法案(公法111-5)资助的。PI正在计划一项实验研究计划,以研究通过原子层沉积在半导体衬底上生长外延晶体氧化物层。晶体氧化物是一类重要的材料,其表现出丰富多样的功能性电子、磁性和光学性质,包括铁电性、热电性、压电性和铁磁性。此外,氧化物可以像元素和化合物半导体一样掺杂,并且它们可以是绝缘的,导电的,半导体的和超导的。为了充分发挥晶体氧化物的潜力,有必要提高晶体氧化物的生长工艺,将晶体氧化物与半导体衬底集成,制作半导体/晶体氧化物混合器件。PI的工艺基于碱土金属氧化物的独特性质和原子层沉积的精确性,在包括Si、Ge和GaAs在内的半导体衬底上生长外延氧化物。该工艺与现有的基于分子束外延的最先进工艺相比具有几个优点。这些优点包括工艺经济性,包括增加的产量、较低的资本和操作成本,以及由于原子层沉积化学的独特方面而简化的处理。该研究计划的成功执行将通过实现基于氧化物电子学的新型器件并激发工业兴趣,对电子材料领域产生变革性影响。该研究的智力价值在于发现了一种基于基本化学相互作用和原子层沉积的反应过程,以在半导体衬底上生长外延氧化物。该研究可以推进沉积过程,表面反应和材料工程的知识。它利用了电子材料中最先进的概念,并提高了设计有用材料的能力。该研究还将促进对半导体/氧化物界面的化学和结构相互作用的理解,这对现代微电子技术很有意义。该研究的更广泛影响包括技术进步,K-12教育的加强,以及对代表性不足的群体的推广。PI计划开展一项外展计划,该计划将影响高中教师、高中学生以及代表性不足和贫困的学生群体。他将为康州大学的达芬奇芬奇项目开发一个基于微电子学的研讨会,为来自不同背景的高中教师提供鼓舞人心的学习经验。该计划将惠及哈特福德的磁铁学校,以促进内城教师和学生未充分利用的人才。这项工作还将教育博士研究生,并为本科生提供研究经验。最后,这项工作将被整合到教学中,作为化学工程和材料科学学生的教育工具。

项目成果

期刊论文数量(0)
专著数量(0)
科研奖励数量(0)
会议论文数量(0)
专利数量(0)

数据更新时间:{{ journalArticles.updateTime }}

{{ item.title }}
{{ item.translation_title }}
  • DOI:
    {{ item.doi }}
  • 发表时间:
    {{ item.publish_year }}
  • 期刊:
  • 影响因子:
    {{ item.factor }}
  • 作者:
    {{ item.authors }}
  • 通讯作者:
    {{ item.author }}

数据更新时间:{{ journalArticles.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ monograph.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ sciAawards.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ conferencePapers.updateTime }}

{{ item.title }}
  • 作者:
    {{ item.author }}

数据更新时间:{{ patent.updateTime }}

Brian Willis其他文献

Brian Willis的其他文献

{{ item.title }}
{{ item.translation_title }}
  • DOI:
    {{ item.doi }}
  • 发表时间:
    {{ item.publish_year }}
  • 期刊:
  • 影响因子:
    {{ item.factor }}
  • 作者:
    {{ item.authors }}
  • 通讯作者:
    {{ item.author }}

{{ truncateString('Brian Willis', 18)}}的其他基金

Growth Engineering of Plasmonic Nanostructures with ALD
ALD 等离子纳米结构的生长工程
  • 批准号:
    2232057
  • 财政年份:
    2023
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
Nanofabricated Model Systems for Investigations of Plasmon Enhanced Reactions
用于研究等离激元增强反应的纳米制造模型系统
  • 批准号:
    2150158
  • 财政年份:
    2022
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
UNS: Tunable Plasmonic Nanostructures by Atomic Layer Deposition
UNS:通过原子层沉积可调谐等离子体纳米结构
  • 批准号:
    1511138
  • 财政年份:
    2015
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Continuing Grant
Collaborative Research: Electro-optical Studies of Nanoscale, Geometrically-Asymmetric Tunnel Junctions for Collection and Rectification of Light from Infrared through Visible
合作研究:纳米级、几何不对称隧道结的光电研究,用于收集和校正红外到可见光
  • 批准号:
    1231248
  • 财政年份:
    2012
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
DNA Sequencing with Nanopores and Transverse Tunneling
利用纳米孔和横向隧道进行 DNA 测序
  • 批准号:
    1102230
  • 财政年份:
    2011
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Continuing Grant
Tunneling Spectroscopy for Nanofabricated Biochemical Sensors
纳米生化传感器的隧道光谱
  • 批准号:
    0935009
  • 财政年份:
    2009
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
CAREER: Perovskite Buffer Layers for Compound Semiconductor-Silicon Heteroepitaxy
职业:用于化合物半导体-硅异质外延的钙钛矿缓冲层
  • 批准号:
    0935010
  • 财政年份:
    2009
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
NER: Engineering the Molecule-Electrode Contact with Novel Molecular Tunnel Junctions
NER:利用新型分子隧道连接设计分子-电极接触
  • 批准号:
    0608730
  • 财政年份:
    2006
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
Tunneling Spectroscopy for Nanofabricated Biochemical Sensors
纳米生化传感器的隧道光谱
  • 批准号:
    0601269
  • 财政年份:
    2006
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
CAREER: Perovskite Buffer Layers for Compound Semiconductor-Silicon Heteroepitaxy
职业:用于化合物半导体-硅异质外延的钙钛矿缓冲层
  • 批准号:
    0239006
  • 财政年份:
    2003
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant

相似国自然基金

偶联剂辅助的“NPs@Oxides”类核-壳结构跨尺度自组装及其甲烷干气重整性能研究
  • 批准号:
    21773069
  • 批准年份:
    2017
  • 资助金额:
    65.0 万元
  • 项目类别:
    面上项目

相似海外基金

CAREER: Overcoming the trade-off between thermopower and conductivity in transition metal oxides
职业生涯:克服过渡金属氧化物热电势和电导率之间的权衡
  • 批准号:
    2340234
  • 财政年份:
    2024
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Continuing Grant
CAREER: Hybrid Bronzes: Mixed-Valence Hybrid Metal Oxides as a Tunable Material Platform
职业:混合青铜:混合价混合金属氧化物作为可调材料平台
  • 批准号:
    2338086
  • 财政年份:
    2024
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Continuing Grant
Manufacturing conductive oxides as catalyst support for energy efficient production of hydrogen and ammonia
制造导电氧化物作为氢和氨节能生产的催化剂载体
  • 批准号:
    2904783
  • 财政年份:
    2024
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Studentship
CAREER: Timely Estimation of Nitrogen Oxides Emissions for Improved Monitoring and Simulation of Atmospheric Chemical Processes
职业:及时估算氮氧化物排放,以改进大气化学过程的监测和模拟
  • 批准号:
    2338758
  • 财政年份:
    2024
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Continuing Grant
Quantifying Natural and Anthropogenic Influences on Nitrogen Oxides Emissions and Chemistry
量化自然和人为对氮氧化物排放和化学的影响
  • 批准号:
    2404581
  • 财政年份:
    2024
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
Exploration of spin topology, emergent inductance, and electron correlations in transition metal oxides
过渡金属氧化物中自旋拓扑、涌现电感和电子相关性的探索
  • 批准号:
    22KF0124
  • 财政年份:
    2023
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Grant-in-Aid for JSPS Fellows
Post Transition Metal Oxides for Optoelectronic Applications (PRAETORIAN)
用于光电应用的后过渡金属氧化物 (PRAETORIAN)
  • 批准号:
    EP/Y019504/1
  • 财政年份:
    2023
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Research Grant
In-situ and ex-situ STEM study of non-conventional line defects in perovskite oxides
钙钛矿氧化物中非常规线缺陷的原位和异位 STEM 研究
  • 批准号:
    2309431
  • 财政年份:
    2023
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Continuing Grant
Understanding Transformation Superplasticity, High Temperature Deformation and Manufacturing of Entropy Stabilized Oxides
了解相变超塑性、高温变形和熵稳定氧化物的制造
  • 批准号:
    2414950
  • 财政年份:
    2023
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Standard Grant
AGS-PRF: Novel Detection of Accelerated Emissions of Nitrogen Oxides Following High Latitude Peat Fires
AGS-PRF:高纬度泥炭火灾后氮氧化物加速排放的新检测
  • 批准号:
    2318739
  • 财政年份:
    2023
  • 资助金额:
    $ 25.91万
  • 项目类别:
    Fellowship Award
{{ showInfoDetail.title }}

作者:{{ showInfoDetail.author }}

知道了