A Novel Fabrication Process for Polysilicon Thin Film Solar Cells
A Novel Fabrication Process for Polysilicon Thin Film Solar Cells
批准号:
0968862
负责人:
Yue Kuo
金额:
$37.09万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2010
资助国家:
美国
项目状态:
已结题
起止时间:
2010-05-01 至 2014-04-30
中文摘要
Please try later.
英文摘要
This grant provides funding for the detailed study of a novel thin-film silicon solar cell fabrication process that uses significantly less energy than current processes. The silicon will be delivered via a low temperature deposition onto a metal layer; the stack will then be crystallized in the solid phase using a novel pulsed rapid thermal annealing process. This study includes an in-depth investigation of the fundamental process-structure relationship that influences the solar cell performance. The experimental study will elucidate the crystallization mechanism by exploring the effects of crystallization rate, concentration profile and grain structure. Optimization of the multi-layer polycrystalline structure and properties will be a goal of the study as well. Although the primary focus is on the single-junction solar cell structure, multiple-junction cells will be fabricated using the same kind of process. Commercial low-temperature glass will be used as the substrate for the solar cell fabrication. If successful, the result of this research will provide a viable solution to the photovoltaic industry, i.e., a low-cost mass production process on the large-area glass substrate with high throughput. The primary goal of this work is to understand the key process factors that affect the bulk and interface polycrystalline thin-film structure and material properties for optimum solar cell performance. The same principle is applicable to the fabrication of a wide range of polycrystalline semiconductor thin films for solar cells and other nano- and micro-electronic devices. This work will also contribute to the advancement of solid-state material science, device fabrication, and rapid thermal annealing processes.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Collaborative Research: Defects Driven Reliability Modeling and Stress Burn-in Optimization in Nanoelectronics Manufacturing
-
批准号:1633580
-
项目类别:Standard Grant
-
资助金额:$24.27万
-
财政年份:2016
-
负责人:Yue Kuo
-
依托单位:
Collaborative Research: Nonparametric Bayesian Modeling of Reliability of Nanoelectronics
-
批准号:0926379
-
项目类别:Standard Grant
-
资助金额:$20.62万
-
财政年份:2009
-
负责人:Yue Kuo
-
依托单位:
Collaborative Research: Modeling Reliability for Scale-Driven Degradation and Spatial Defects
-
批准号:0654172
-
项目类别:Standard Grant
-
资助金额:$15.74万
-
财政年份:2007
-
负责人:Yue Kuo
-
依托单位:
NER: Exploring the nano structural properties of the 2 nm interface layer of the metal oxide and its nano device characteristics
-
批准号:0403280
-
项目类别:Standard Grant
-
资助金额:$10.0万
-
财政年份:2004
-
负责人:Yue Kuo
-
依托单位:
SGER: Exploring A Novel Bipolar Thin-Film Transistor of Nanocrystalline Silicon Material
-
批准号:0236835
-
项目类别:Standard Grant
-
资助金额:$6.99万
-
财政年份:2003
-
负责人:Yue Kuo
-
依托单位:
NER: Exploring a Nanoscale Amorphous Silicon Thin Film Transistor
-
批准号:0301960
-
项目类别:Standard Grant
-
资助金额:$8.0万
-
财政年份:2003
-
负责人:Yue Kuo
-
依托单位:
SGER: Identifying and Characterizing Reliability Properties for a Sub 5 nm High k Dielectric Device
-
批准号:0243409
-
项目类别:Standard Grant
-
资助金额:$9.71万
-
财政年份:2003
-
负责人:Yue Kuo
-
依托单位:
NER: Exploring A Novel Plasma-Based Copper Nano-Line Etch Method for Nano-Devices And Circuits
-
批准号:0103022
-
项目类别:Standard Grant
-
资助金额:$8.12万
-
财政年份:2001
-
负责人:Yue Kuo
-
依托单位:
Acquisition of a Multi-Purpose, Multi-User Mask Aligner
-
批准号:9912490
-
项目类别:Standard Grant
-
资助金额:$7.84万
-
财政年份:2000
-
负责人:Yue Kuo
-
依托单位:
Amorophous Silicon-Based Thin Film Diodes
-
批准号:0000806
-
项目类别:Fellowship Award
-
资助金额:$4.08万
-
财政年份:2000
-
负责人:Yue Kuo
-
依托单位:
海外基金