EFRI 2-DARE: 2D Crystals formed by Activated Atomic Layer Deposition
EFRI 2-DARE: 2D Crystals formed by Activated Atomic Layer Deposition
批准号:
1433378
负责人:
Joan Redwing
金额:
$196.45万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2014
资助国家:
美国
项目状态:
已结题
起止时间:
2014-09-15 至 2020-02-29
中文摘要
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英文摘要
Non-Technical: Transition metal chalcogenides (TMCs) crystallize as two-dimensional sheets of atoms, giving them unusual electronic properties that can be varied by changing the number, arrangement and compositions of the layers. The adjustment of these parameters provides manufacturing challenges that must be overcome to realize potential applications in electronics, photonics and related technologies. The project will research new deposition and processing methods for novel thin film and superconducting devices. This research will enable atomic level film formation at low temperatures that are compatible with low-cost glass and plastic substrates. Techniques to integrate metal contact layers and dielectric films with TMCs to produe working devices will also be researched. The project will support the research of five graduate students and summer research opportunities for undergraduates and high school students from underrepresented groups and economically challenged regions of Pennsylvania. Undergraduates will also participate in the project as part of their senior capstone engineering design project organized through the Learning Factory at Penn State.Technical: This EFRI 2-DARE project is aimed at the development of new synthetic routes and integration strategies for monolayer and multilayer transition metal chalcogenides (TMCs) to enable discovery of fundamental structure-property relationships, the exploration of novel physical phenomena, and the creation of new thin film and superconducting device technologies. An activated atomic layer deposition (ALD) process for WSe2, FeSe, NbSe2 and related 2D materials will be developed that incorporates thermal and plasma sources to promote precursor decomposition, thereby enabling reduced substrate temperatures that are needed for deposition and dielectric/metal integration on van der Waals surfaces. Epitaxial templating and substrate patterning will be used to control nucleation and promote in-plane forces to induce self-assembly of 2D islands over large areas. In-situ diagnostics will be used to provide insights into the ALD chemistry. Ultra-high resolution aberration-corrected (scanning) transmission electron microscopy ((S)TEM) imaging and related spectroscopy techniques will enable direct imaging and chemical characterization of defects in monolayer and multilayer films, providing information not always accessible by conventional TEM. Device fabrication processes will be developed to enable detailed studies of electrical transport and superconductivity in TMCs. Gated current-voltage measurements, Hall-effect, and quasi-static capacitance-voltage measurements will be used to characterize the transport properties of WSe2 and WS2 thin film devices. Superconductivity in gated FeSe and NbSe2 structures will also be examined to seek high-temperature and unconventional superconductivity.
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会议论文
Participant Support for the 23rd American Conference on Crystal Growth and Epitaxy (ACCGE-23); Tucson, Arizona; 13-18 August 2023
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批准号:2333144
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项目类别:Standard Grant
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资助金额:$0.7万
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财政年份:2023
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负责人:Joan Redwing
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依托单位:
MIP: 2D Crystal Consortium (MIP-2DCC)
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批准号:2039351
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项目类别:Cooperative Agreement
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资助金额:$2010.0万
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财政年份:2021
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负责人:Joan Redwing
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依托单位:
Participation Support for Students to Attend the 22nd American Conference on Crystal Growth and Epitaxy, Virtual, August 2-4, 2021
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批准号:2138270
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项目类别:Standard Grant
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资助金额:$0.7万
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财政年份:2021
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负责人:Joan Redwing
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依托单位:
EAGER Collaborative Research: Fundamentals of Tunneling, Heterojunction-based 2D-Hot Electron Transistors
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批准号:2029729
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项目类别:Standard Grant
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资助金额:$6.54万
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财政年份:2020
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负责人:Joan Redwing
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依托单位:
2019 17th International Summer School on Crystal Growth (ISSCG-17)(Granby, Colorado)
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批准号:1917552
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项目类别:Standard Grant
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资助金额:$3.0万
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财政年份:2019
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负责人:Joan Redwing
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依托单位:
Graphene Encapsulated Growth of 2D Materials
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批准号:1808900
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项目类别:Standard Grant
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资助金额:$43.0万
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财政年份:2018
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负责人:Joan Redwing
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依托单位:
NSF EFRI-2DARE, DMREF-2D and MIP Grantees Meeting to be held in November 13-15, 2017 in State College, PA
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批准号:1748382
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项目类别:Standard Grant
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资助金额:$4.98万
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财政年份:2017
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负责人:Joan Redwing
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依托单位:
MIP: 2D Crystal Consortium (MIP-2DCC)
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批准号:1539916
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项目类别:Cooperative Agreement
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资助金额:$1778.76万
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财政年份:2016
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负责人:Joan Redwing
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依托单位:
PFI:AIR - TT: One-Step Process for High Efficiency Textured Solar Cells
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批准号:1414236
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项目类别:Standard Grant
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资助金额:$20.0万
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财政年份:2014
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负责人:Joan Redwing
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依托单位:
GOALI: Strained Layer Heterostructures for GaN-on-Si Epitaxy
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批准号:1410765
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项目类别:Standard Grant
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资助金额:$39.0万
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财政年份:2014
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负责人:Joan Redwing
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依托单位:
Film Stress and Morphology Evolution during MOCVD Growth of InGaN
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批准号:1006763
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项目类别:Continuing Grant
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资助金额:$38.8万
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财政年份:2010
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负责人:Joan Redwing
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依托单位:
Stress Evolution during Group III-Nitride Heteroepitaxy
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批准号:0606451
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项目类别:Standard Grant
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资助金额:$38.14万
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财政年份:2006
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负责人:Joan Redwing
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依托单位:
NIRT: Semiconductor Nanowire Electronics
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批准号:0609282
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项目类别:Standard Grant
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资助金额:$100.0万
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财政年份:2006
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负责人:Joan Redwing
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依托单位:
NIRT: Semiconductor Nanowires: Building Blocks for Nanoscale Electronics
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批准号:0103068
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项目类别:Continuing Grant
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资助金额:$145.0万
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财政年份:2001
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负责人:Joan Redwing
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依托单位:
CAREER: Development of Strain-Engineered AlGalnN Heterostructures for Electronic Device Applications
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批准号:0093742
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项目类别:Continuing Grant
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资助金额:$0.0万
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财政年份:2001
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负责人:Joan Redwing
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依托单位:
Acquisition of an MOVPE System for Electronic Materials Research and Education
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批准号:0076312
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项目类别:Standard Grant
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资助金额:$15.0万
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财政年份:2000
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负责人:Joan Redwing
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依托单位:
SBIR PHASE I: SiC on Insulator for High Frequency Devices
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批准号:9561370
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项目类别:Standard Grant
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资助金额:$7.5万
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财政年份:1996
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负责人:Joan Redwing
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依托单位:
海外基金