Participant Support for the 23rd American Conference on Crystal Growth and Epitaxy (ACCGE-23); Tucson, Arizona; 13-18 August 2023

这笔赠款为将于2023年8月13日至18日在亚利桑那州图森市举行的第23届美国晶体生长和外延会议(ACCGE-23)的与会者提供支持。会议重点介绍了块状单晶和外延薄膜生长方面的新的研究和开发活动。学生和教职员工通过口头和海报展示他们在晶体生长和外延方面的最新研究成果。这次会议影响了先进制造业和更广泛的工程界。学生和年轻教职人员优先考虑女性或来自代表性不足的少数群体。这一方法在短期内促进了会议的多样化参与，在长期内促进了STEM领域的多样化参与。这一奖项通过教育熟练和多样化的制造业劳动力使国家受益，他们更好地准备好为他们选择的领域的挑战提供变革性的解决方案。这次会议在支持和支持晶体生长和外延这一重要领域发挥了重要作用，晶体生长和外延是半导体和微电子研究的重要组成部分。这次会议是适时的，因为美国对振兴微电子和半导体制造重新产生了兴趣，这一参与者的支持预计将有利于学生的专业、科学和技术发展。参加会议的学生和教师对晶体生长和薄膜外延、其基本原理、先进制造、先进表征和应用有了更广泛的看法。研讨会的主题包括材料合成的基础、晶体结构分析、晶体生长技术和方法、高通量制造、工艺建模、监测和控制，以及二维纳米材料、陶瓷、铁电和微流控加工等专门主题。这次会议为与会者提供了一个机会，展示他们的科学成就，与学术界、政府实验室和行业的同行和同事互动，并扩大他们在广泛的材料加工和先进制造业社区中的网络。与会者将通过访问几个由国内和国际主要演讲者进行的技术和专业发展讲座，了解其技术领域的最先进研究。学生和年轻教师通过口头和海报演示以及与技术领域同行深入讨论他们的工作来提高他们的沟通技能。这种互动体验极大地拓宽了学生教育，提高了他们对研究主题的热情，让他们熟悉了对科学职业的期望，并使他们接触到创新研究的新方法。该奖项反映了NSF的法定使命，并通过使用基金会的智力优势和更广泛的影响审查标准进行评估，被认为值得支持。

This grant provides participant support for attendees of the 23rd American Conference on Crystal Growth and Epitaxy (ACCGE-23) to be held in Tucson, Arizona, 13-18 August 2023. The conference focuses on new research and development activities in bulk single crystal and epitaxial thin film growth. Students and faculty present their latest research results on crystal growth and epitaxy through oral and poster sessions. The conference impacts the advanced manufacturing and broader engineering communities. Priority is given to student and young faculty participants who are women or who come from underrepresented minority groups. This approach promotes diverse participation at the conference, in the short term, and in STEM fields, in the long term. This award benefits the nation through the education of a skilled and diverse manufacturing workforce, which is better prepared to provide transformative solutions to the challenges in their chosen fields. The conference plays an important role in supporting and sustaining the important field of crystal growth and epitaxy, which is an important component of semiconductor and microelectronics research. This conference is timely because of renewed interest in the revitalization of microelectronics and semiconductor manufacturing in the US.This participant support is expected to benefit the students' professional, scientific, and technical development. Attendance at the conference gives the students and faculty a broader view of crystal growth and thin film epitaxy, its fundamentals, advanced manufacturing, advanced characterization, and applications. Symposium topics include fundamentals of materials synthesis, crystal structure analysis, crystal growth techniques and methods, high throughput manufacturing, process modeling, monitoring and control, and specialized topics, such as 2D nanomaterials, ceramics, ferroelectrics, and microfluidic processing. The conference is an opportunity for participants to showcase their scientific accomplishments, interact with peers and colleagues in academia, government labs and industry and extend their network within the broad materials processing and advanced manufacturing communities. Attendees will learn about state-of-the-art research in their technical areas via access to several technical and professional development talks by leading domestic and international speakers. Students and young faculty enhance their communication skills through oral and poster presentations and in-depth discussions of their work with peers in their technical areas. This interactive experience significantly broadens student education, increases their enthusiasm for their research topic, acquaints them with expectations for scientific careers, and exposes them to new approaches for innovative research.This award reflects NSF's statutory mission and has been deemed worthy of support through evaluation using the Foundation's intellectual merit and broader impacts review criteria.