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Method Development for Measuring Procedures for the In-Process-Characterisation of Sub-100-nm-Structures

亚 100 纳米结构过程表征测量程序的方法开发

基本信息

批准号：
254132876
负责人：
Professor Dr.-Ing. Gert Goch
金额：
--
依托单位：
Bremer Institut für Messtechnik, Automatisierung und Qualitätswissenschaft (BIMAQ)
依托单位国家：
德国
项目类别：
Research Grants
财政年份：
2014
资助国家：
德国
起止时间：
2013-12-31 至 2018-12-31
项目状态：
已结题

来源：
https://gepris.dfg.de/gepris/projekt/254132876?language=en
关键词：
Method Development Measuring Procedures Process

项目摘要

Microtechnology and nanotechnology belong to the economic areas with the highest growth forecasts. In recent times, particularly in the area of the coating technologies, an increasing number of applications are on route to mass production. However, one of the largest remaining challenges is the realisation of an adequate process control. From this fact a rising demand for suitable in-process measuring procedures results. Theoretical examinations show that scattered light distributions principally contain information about existing nanostructures of the illuminated surfaces. Due to the fast, integral and contactless data acquisition, scattered light measuring procedures are predestined for in-process measurements of nanostructured systems. Unfortunately, the inverse problem cannot easily be solved because it is not possible to trace back to the underlying structures or to process deviations from the measured scattered light distributions. A first approach to solve this problem by rigorous light scattering simulations was examined in the DFG Priority Program SPP1327. Current research results show that the development of scattered light measuring procedures based on simulations is principally possible.The aim of this project is the realisation of a methodology for the development of scattered-light-based in-process measuring procedures for arbitrary nanostructured surfaces. This methodology shall result from the findings from three technical applications. In the first year of the research funding, an in-process measuring procedure for global stochastic defects is to be realized which is based on the preliminary investigations. The knowledge gathered with this system will be used as base for the development of the methodology. In the second year the planned characterisation of local occurring defects is related with a substantially higher measuring effort. The finally regarded deterministic defects represent the largest challenge in both areas: the technical realisation and the knowledge integration into the methodology. Stochastic effects induced by the surface roughness dominate, therefore there are no obvious deviations to be expected in the scattered light distributions. Thus the requirements to the measuring technique and also to the algorithms are substantially higher.

微型技术和纳米技术属于增长预测最高的经济领域。近年来，特别是在涂层技术领域，越来越多的应用正在走向大规模生产。然而，最大的挑战之一是实现充分的过程控制。因此，对合适的过程中测量程序的需求不断增加。理论研究表明，散射光分布主要包含有关被照射表面的现有纳米结构的信息。由于快速、完整和非接触式数据采集，散射光测量程序注定用于纳米结构系统的过程测量。不幸的是，逆问题不能容易地解决，因为它是不可能追溯到底层结构或处理从测量的散射光分布的偏差。DFG优先计划SPP1327中研究了通过严格的光散射模拟来解决这个问题的第一种方法。目前的研究结果表明，基于模拟的散射光测量程序的发展原则上是可能的。该项目的目的是实现一种方法，用于开发基于散射光的任意纳米结构表面的过程中测量程序。这一方法应来自三种技术应用的结果。在研究基金的第一年，一个过程中的测量程序的全球随机缺陷是实现这是基于初步调查。该系统收集的知识将用作方法学开发的基础。在第二年，计划对局部发生的缺陷进行表征，这与更高的测量工作有关。最后考虑的确定性缺陷代表了这两个领域的最大挑战：技术实现和知识集成到方法中。由表面粗糙度引起的随机效应占主导地位，因此在散射光分布中没有预期的明显偏差。因此，对测量技术以及算法的要求实质上更高。