Microscopic analysis on surface reaction induced by laser irradiation and its application to atomic layr epitaxy
Microscopic analysis on surface reaction induced by laser irradiation and its application to atomic layr epitaxy
批准号:
06452111
负责人:
MATSUNAMI Hiroyuki
金额:
$4.61万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for General Scientific Research (B)
财政年份:
1994
资助国家:
日本
项目状态:
已结题
起止时间:
1994 至 1995
中文摘要
在金属有机分子束外延(MOMBE)中,用激光触发同时供给三乙基镓和热裂解的PH_3,实现了GaP生长的原子层控制。在较低的衬底温度下,用N_2激光器发射的紫外光提高了GaP的生长速率。生长速率由激光脉冲之间的TEGa供应或光子数控制,并且其在高TEGa供应下显示饱和。用反射式高能电子衍射(RHEED)方法研究了350 ℃低温下脉冲激光辐照GaP生长引发的表面反应,发现激光辐照后,RHEED强度急剧下降,然后逐渐恢复。突然的减少表明,吸附在GaP表面上的TEGa被激光照射光分解。强度恢复对PH_3流量有很大的依赖性,表明强度恢复与光分解的TEGa和P原子之间的表面反应有关。这一结果表明,TEGa的激光分解和GaP的形成交替发生在源气体的连续供应。这开辟了一种新的模式,ALE触发激光照射源气体没有交替供应。
英文摘要
Control of GaP growth at the atomic-layr level has been achieved by laser-triggering in metalorganic molecular beam epitaxy (MOMBE) under a simultaneous supply of triethylgallium and thermally cracked PH_3. The growth rate of GaP was enhanced at low substrate temperatures by ultraviolet light emitted from a N_2 laser. The growth rate is controlled by either the TEGa supply between laser pulses or the photon number, and it shows saturation with a high TEGa supply. This suggests that the adsorption of TEGa on a surface saturates.Surface reactions triggered by pulsed laser irradiation for GaP growth were studied with reflection high-energy electron diffraction (RHEED) at a low temperature of 350゚C IN MOMBE.On the laser irradiation, the intensity of RHEED showed an abrupt decrease followed by gradual recovery. The abrupt decrease indicates that adsorbed TEGa on a GaP surface is photo-decomposed by the laser irradiation. The intensity recovery had much dependence on PH_3 flow rate, which indicates that the intensity recovery is related with surface reaction between photo-decomposed TEGa and P atoms. This result shows that the decomposition of TEGa by laser irradiation and the formation of GaP occur alternately under continuous supply of source geses. This opens up a new mode of ALE triggered by laser irradiation without alternate supply of source gases.
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M. Yoshimoto: "In-situ RHEED observation on surface reactions in laser-triggered chemical beam epitaxy of GaP" Applied Surface Science. 79/80. 227/231 (1994)
M. Yoshimoto:“激光触发化学束外延 GaP 表面反应的原位 RHEED 观察”应用表面科学。
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通讯作者:
Hiroyuki Matsunami: "In-situ Reflection High-Energy Electron Diffraction Observation of Laser-Triggered Gap Growth in Chemical Beam Epitaxy" J.Crystal Growth. 136. 89-93 (1994)
Hiroyuki Matsunami:“化学束外延中激光触发间隙生长的原位反射高能电子衍射观察”J.Crystal Growth。
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Hiroyuki Matsunami: "In-situ RHEED Observation on Surface Reactions in Laser-Triggered Chemical Beam Epitaxy of Gap" Appl.Surface Science. 79/80. 227-231 (1994)
Hiroyuki Matsunami:“激光触发化学束间隙外延表面反应的原位 RHEED 观察”Appl.Surface Science。
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M. Yoshimoto: "Laser decomposition of surface adsorbed metalorganics in MOMBE" Transaction Materials Research Society, Japan. 19A. 163-166 (1994)
M. Yoshimoto:“MOMBE 中表面吸附金属有机物的激光分解”,日本材料研究学会交易。
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N. Tamura: "Book title" Publishers name, 100 (1994)
N. Tamura:“书名” 出版商名称,100 (1994)
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共 6 条
Control of Electronic Properties of Wide Bandgap Semiconductor and Application to Energy Electronics
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Electronic Behavior ofWide-Gap Semiconductor and Devices
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Low Temperature Epitaxial Growth of Refractory Crystals by Photo-ionization
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依托单位:
Fabrication of active devices using semiconducting SiC for use in heavy environment
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