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Ion implantation doping of gallium nitride for high performance electronic devices

Ion implantation doping of gallium nitride for high performance electronic devices
用于高性能电子器件的氮化镓的离子注入掺杂
批准号:
DP0559840
负责人:
Prof Giacinta Parish
金额:
$47.4万
依托单位国家:
澳大利亚
项目类别:
Discovery Projects
财政年份:
2005
资助国家:
澳大利亚
项目状态:
已结题
起止时间:
2005-02-08 至 2008-12-23

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中文摘要
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英文摘要
This project forms part of a long-term, international research program into the development of high-power, high-frequency electronics for high performance radar and communications systems. The advanced fabrication technologies and designs being investigated in this project fall well within the designated priority goal of Frontier Technologies. Gallium nitride technology is also of high interest to defence organisations, as radar and satellite-communications links, which operate at frequencies ranging from hundreds of MHz to tens of GHz, often have high power-amplification requirements. The project therefore also falls within the priority goal of Transformational Defence Technologies.
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海外基金