Laser Crystallization of non two-dimensional Si substrates and their device application
Laser Crystallization of non two-dimensional Si substrates and their device application
批准号:
20246006
负责人:
URAOKA Yukiharu
金额:
$20.97万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2008
资助国家:
日本
项目状态:
已结题
起止时间:
2008 至 2010
中文摘要
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英文摘要
We crystallized one dimensional or three dimensional silicon thin film and applied this method to the fabrication of thin film transistors or thin film photo diodes. We demonstrated the effectiveness of this technique by operating high functional devices. This method is promising for the realization of next generation information devices.
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DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[T.Yamashita, Y.Sugawara, Y.Uraoka, T.Fuyuki, M.Kimura]
通讯作者:
M.Kimura
DOI:
10.1143/jjap.47.6236
发表时间:
2008-08-01
期刊:
JAPANESE JOURNAL OF APPLIED PHYSICS
影响因子:
1.5
作者:
[Fujii, Mami, Yano, Hiroshi, Kwon, Jang Yeon]
通讯作者:
Kwon, Jang Yeon
Experimental and Theoretical Analysis of In2O3-Ga2O3-ZnO Thin Film Transistors under Constant Voltage Stress
恒压应力下In2O3-Ga2O3-ZnO薄膜晶体管的实验与理论分析
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[M.Fujii, Y.Uraoka, T.Fuyuki, J.Jun, J.Kwon]
通讯作者:
J.Kwon
薄膜トランジスタ(薄膜材料デバイス研究会)
薄膜晶体管(薄膜材料与器件研究组)
DOI:
--
发表时间:
2008
期刊:
影响因子:
--
作者:
[M.Wilde, K.Fukutani, 浦田千尋,山内悠輔,青山祐子,黒田一幸, 浦岡行治(共著)]
通讯作者:
浦岡行治(共著)
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[Y. Sugawara, H. Yano, T, Hatayama, Y. Uraoka, T. Fuyuki]
通讯作者:
T. Fuyuki
共 36 条
Highly reliable GaN power device fabricated using supercritical water
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批准号:16H04332
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$10.73万
-
财政年份:2016
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负责人:URAOKA Yukiharu
-
依托单位:
Low temperature polycrystalline thin film transistors for next generation high performance display
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批准号:23360137
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$12.65万
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财政年份:2011
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负责人:URAOKA Yukiharu
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依托单位:
Research of Bio-nano Display using Ferritin Protein
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批准号:17360164
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.47万
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财政年份:2005
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负责人:URAOKA Yukiharu
-
依托单位:
Two dimensional crystallization of ferritin protein for nano-scale process in semiconductor fabrication
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批准号:15360013
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$8.64万
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财政年份:2003
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负责人:URAOKA Yukiharu
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依托单位:
海外基金