Development of High-Rep-Rate Ion Induced Secondary Emission Electron Gun and Its Application
Development of High-Rep-Rate Ion Induced Secondary Emission Electron Gun and Its Application
批准号:
10555088
负责人:
HOTTA Eiki
金额:
$8.26万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
1998
资助国家:
日本
项目状态:
已结题
起止时间:
1998 至 2000
中文摘要
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英文摘要
A secondary emission electron gun applicable to a gas treatment was designed, fabricated and tested.The gun is set beside an ion source, which is called a wire ion plasma source (WIPS). In the gun, ions extracted from the WIPS are accelerated toward a cathode surface, which is set oblique to the ion loci. By collision of ions, secondary electrons emitted from the cathode surface are then accelerated toward the electron window and form a very wide electron beam. The electron window, which is between the electron gun and a gas treatment chamber, is set orthogonal to the ion extraction window and is on earth potential. In order to design a structure of cathode, which can inject the electron beam perpendicular to the electron window, the ion and the electron trajectories were numerically simulated for several conditions. The characteristic of the electron gun has been subsequently evaluated in terms of ion and electron beam currents at the accelerating voltage up to 100 kV.A 15 μm thick aluminum foil supported by a honeycomb board is placed at the electron window as a vacuum seal between the electron gun and the gas treatment chamber. The electron beam current distribution inside the gas treatment chamber has been evaluated in a vacuum condition. A uniform electron beam has been detected inside the gas treatment chamber. A relatively large cross section (64.5 cm^2) electron beam with a current density of about 15 mA/cm^2 is available for the gas treatment. It is expected that such current density level will offer an efficient NO_X treatment.
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P.R.Chalise,M.Ishikawa,M.Watanabe,A.Okino,K-C.Ko and E.Hotta: "Side-Extraction-Type Secondary-Emission Electron Gun Using Wire Ion Plasma Source"13th International Conf.on High-Power Particle Beams. (予定). (2000)
P.R.Chalise、M.Ishikawa、M.Watanabe、A.Okino、K-C.Ko 和 E.Hotta:“使用线离子等离子体源的侧引式二次发射电子枪”第十三届国际高功率粒子束会议(计划)。
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石川雅規,プリヤ・ラズ・チャリセ,渡辺正人,沖野晃俊,堀田栄喜: "横出し型イオン衝撃二次電子銃の研究"平成12年電気学会全国大会講演論文集. 1. 343-343 (2000)
Masanori Ishikawa、Priya Raz Charisse、Masato Watanabe、Akitoshi Okino、Eiki Hotta:“侧挤压离子撞击二次电子枪的研究”日本电气工程师学会 2000 年全国会议论文集 1. 343-343(2000 年)。 )
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M.Akiyama,K.Minami,M.Watanabe,A.Okino,K-C.Ko and E.Hotta: "De-NOx by Bidirectional Pulse Corona Discharge"IEEE International Conference on Plasma Science. 107-107 (2000)
M.Akiyama、K.Minami、M.Watanabe、A.Okino、K-C.Ko 和 E.Hotta:“双向脉冲电晕放电脱硝”IEEE 国际等离子体科学会议。
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石川雅規,神戸直樹,他: "ワイヤ・イオン・プラズマ源を用いた横出し型二次電子銃の研究" 平成11年電気学会全国大会. (予定). (1999)
Masanori Ishikawa、Naoki Kobe 等人:“使用线离子等离子体源的侧射二次电子枪的研究”1999 年日本电气工程师学会全国会议(暂定)(1999 年)。
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P.R.Chalise, M.Ishikawa, M.Watanabe, A.Okino, K-C.Ko and E.Hotta: "SIDE EXTRACTION TYPE SECONDARY EMISSION ELECTRON GUN USING WIRE ION PLASMA SOURCE"Proceedings of 13^<th> International Conference on High-Power Particle Beams. Vol.1. 86-89 (2001)
P.R.Chalise、M.Ishikawa、M.Watanabe、A.Okino、K-C.Ko 和 E.Hotta:“SIDE EXTRACTION TYPE SECONDARY EMISSION ELECTRON GUN USING WIRE ION PLASMA SOURCE”第 13 届国际高功率会议论文集
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财政年份:2005
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负责人:HOTTA Eiki
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依托单位:
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