Development of High-Rep-Rate Ion Induced Secondary Emission Electron Gun and Its Application

高重复频率离子诱导二次发射电子枪的研制及其应用

• 批准号: 10555088
• 负责人: HOTTA Eiki
• 金额: $ 8.26万
• 依托单位: Tokyo Institute of Technology
• 依托单位国家: 日本
• 项目类别: Grant-in-Aid for Scientific Research (B)
• 财政年份: 1998
• 资助国家: 日本
• 起止时间: 1998 至 2000
• 项目状态: 已结题
• 来源: https://kaken.nii.ac.jp/en/grant/KAKENHI-PROJECT-10555088/
• 关键词: Wire Ion Plasma Source; Ion Bombardment; Secondary Electron; Electron Gun; Electron Beam; 気体処理; ワイヤ・イオン・プラズマ

A secondary emission electron gun applicable to a gas treatment was designed, fabricated and tested.The gun is set beside an ion source, which is called a wire ion plasma source (WIPS). In the gun, ions extracted from the WIPS are accelerated toward a cathode surface, which is set oblique to the ion loci. By collision of ions, secondary electrons emitted from the cathode surface are then accelerated toward the electron window and form a very wide electron beam. The electron window, which is between the electron gun and a gas treatment chamber, is set orthogonal to the ion extraction window and is on earth potential. In order to design a structure of cathode, which can inject the electron beam perpendicular to the electron window, the ion and the electron trajectories were numerically simulated for several conditions. The characteristic of the electron gun has been subsequently evaluated in terms of ion and electron beam currents at the accelerating voltage up to 100 kV.A 15 μm thick aluminum foil supported by a honeycomb board is placed at the electron window as a vacuum seal between the electron gun and the gas treatment chamber. The electron beam current distribution inside the gas treatment chamber has been evaluated in a vacuum condition. A uniform electron beam has been detected inside the gas treatment chamber. A relatively large cross section (64.5 cm^2) electron beam with a current density of about 15 mA/cm^2 is available for the gas treatment. It is expected that such current density level will offer an efficient NO_X treatment.

设计、制作并测试了一种用于气体处理的二次发射电子枪，该电子枪置于线状离子等离子体源（WIPS）旁。在枪中，从WIPS提取的离子朝向阴极表面加速，该阴极表面被设置为与离子轨迹倾斜。通过离子的碰撞，从阴极表面发射的二次电子然后朝向电子窗加速并形成非常宽的电子束。位于电子枪和气体处理室之间的电子窗被设置为与离子提取窗正交并且处于地电位。为了设计一种垂直于电子窗注入电子束的阴极结构，对几种情况下的离子和电子轨迹进行了数值模拟。在加速电压高达100 kV时，用离子流和电子束流对电子枪的特性进行了评价。在电子窗处放置一层15 μm厚的铝箔，铝箔由蜂窝板支撑，作为电子枪和气体处理室之间的真空密封。在真空条件下对气体处理室内的电子束电流分布进行了评价。在气体处理室内检测到均匀的电子束。对于气体处理，可以使用电流密度约为15 mA/cm^2的相对较大横截面（64.5 cm^2）的电子束。预计这种电流密度水平将提供有效的NO_X处理。

项目成果

P.R.Chalise,M.Ishikawa,M.Watanabe,A.Okino,K-C.Ko and E.Hotta: "Side-Extraction-Type Secondary-Emission Electron Gun Using Wire Ion Plasma Source"13th International Conf.on High-Power Particle Beams. (予定). (2000)

P.R.Chalise、M.Ishikawa、M.Watanabe、A.Okino、K-C.Ko 和 E.Hotta：“使用线离子等离子体源的侧引式二次发射电子枪”第十三届国际高功率粒子束会议（计划）。

石川雅規,プリヤ・ラズ・チャリセ,渡辺正人,沖野晃俊,堀田栄喜: "横出し型イオン衝撃二次電子銃の研究"平成12年電気学会全国大会講演論文集. 1. 343-343 (2000)

Masanori Ishikawa、Priya Raz Charisse、Masato Watanabe、Akitoshi Okino、Eiki Hotta：“侧挤压离子撞击二次电子枪的研究”日本电气工程师学会 2000 年全国会议论文集 1. 343-343（2000 年）。 ）

M.Akiyama,K.Minami,M.Watanabe,A.Okino,K-C.Ko and E.Hotta: "De-NOx by Bidirectional Pulse Corona Discharge"IEEE International Conference on Plasma Science. 107-107 (2000)

M.Akiyama、K.Minami、M.Watanabe、A.Okino、K-C.Ko 和 E.Hotta：“双向脉冲电晕放电脱硝”IEEE 国际等离子体科学会议。

石川雅規,神戸直樹,他: "ワイヤ・イオン・プラズマ源を用いた横出し型二次電子銃の研究" 平成11年電気学会全国大会. (予定). (1999)

Masanori Ishikawa、Naoki Kobe 等人：“使用线离子等离子体源的侧射二次电子枪的研究”1999 年日本电气工程师学会全国会议（暂定）（1999 年）。

P.R.Chalise, M.Ishikawa, M.Watanabe, A.Okino, K-C.Ko and E.Hotta: "SIDE EXTRACTION TYPE SECONDARY EMISSION ELECTRON GUN USING WIRE ION PLASMA SOURCE"Proceedings of 13^<th> International Conference on High-Power Particle Beams. Vol.1. 86-89 (2001)

P.R.Chalise、M.Ishikawa、M.Watanabe、A.Okino、K-C.Ko 和 E.Hotta：“SIDE EXTRACTION TYPE SECONDARY EMISSION ELECTRON GUN USING WIRE ION PLASMA SOURCE”第 13 届国际高功率会议论文集