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Application of microplasma to materials device process

Application of microplasma to materials device process
微等离子体在材料器件工艺中的应用
批准号:
15075202
负责人:
TERASHIMA Kazuo
金额:
$53.38万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research on Priority Areas
财政年份:
2003
资助国家:
日本
项目状态:
已结题
起止时间:
2003 至 2007

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中文摘要
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英文摘要
Based on the unique characteristics of microplasmas, such as an extraordinary locality and high density, development of various new application technologies are in progress. These include, e.g., novel materials processing, biomaterials treatment, chemical analysis, light sources of ultra-short wavelengths.In our group, in order to establish microplasma materials device processing, these studies have been performed as follows:(A) Development of high-rate materials device processing with using supercritical fluid (SCF) plasma: We developed supercritical fluid plasma devices and diagnosed the plasma properties. Applications of it to deposition of carbon and copper thin films were performed. These achievements make the non-equilibrium with high density and high-synthesis preparation of carbon nano-materials near the critical point.(B) Synthesis of novel materials by various microplasmas: We developed various types of microplasmas, such as atmospheric and in liquid plasma devices. Plasma diagnoses were performed to observe the super-non-equilibrium. Novel carbon-nano-materials were also found.(C) Fabrication of integrated plasma materials processing devices (plasma chip and plasma panel): We developed integrated plasma materials processing devices such as plasma chip and plasma panel, and diagnosed their plasma properties.
期刊论文(196)
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Development of wire spraying for direct micro-patterning via an atmospheric- pressure UHF inductively coupled microplasma iet
通过常压 UHF 感应耦合微等离子体网络直接微图案化的线材喷涂的开发
DOI: --
发表时间: 2006
期刊: Surf. Coat. Technol. 200
影响因子: --
作者: [T. Yokoyama, Y. Shimizu]
通讯作者: Y. Shimizu
Carbon nanotube and nanopolyhedron syntheses by a dischargeunder a sunercritical fluid environment
太阳临界流体环境下放电合成碳纳米管和纳米多面体
DOI: --
发表时间: 2004
期刊: J. Mater. Chem. 14
影响因子: --
作者: [矢澤美穂, 千葉亮, 鷹野芳樹, 開康一, 山本浩史, 高橋利宏, 中村敏和, N. Shirai, C. Y. Li, S. Kawata, O. Sakai, T. Shirafuji, T. Sakurai, T. Ito]
通讯作者: T. Ito
Fabrication of spherical carbon via UHF inductively coupled microplasma CVD
通过 UHF 感应耦合微等离子体 CVD 制造球形碳
DOI: --
发表时间: 2003
期刊: J. Phys. D : Appl. Phys. 36
影响因子: --
作者: [Oroguchi, T., C. Y. Li, K. Ishii, Y. Shimizu]
通讯作者: Y. Shimizu
Development of cross-flow micro-nebulizer for atmospheric pressure microplasma deposition and its application to prepare nano-carbon materials from alcohol
常压微等离子体沉积错流微雾化器的研制及其在乙醇制备纳米碳材料中的应用
DOI: --
发表时间: 2006
期刊: Transactions of the Material Research Society of Japan (掲載決定印刷中)
影响因子: --
作者: [萩原嘉伸, 渡邉裕, 林偉民, 劉慶, 大森整, 村田泰彦, 清水禎樹 他]
通讯作者: 清水禎樹 他
68
    Creation of cryoplasma materials process science
    • 批准号:
      24246120
    • 项目类别:
      Grant-in-Aid for Scientific Research (A)
    • 资助金额:
      $29.7万
    • 财政年份:
      2012
    • 负责人:
      TERASHIMA Kazuo
    • 依托单位:
    Development of novel materials surface modification/fabricationTechnology with a use of supercritical fluid ion beam
    • 批准号:
      24656436
    • 项目类别:
      Grant-in-Aid for Challenging Exploratory Research
    • 资助金额:
      $2.58万
    • 财政年份:
      2012
    • 负责人:
      TERASHIMA Kazuo
    • 依托单位:
    Generation of ccryoplasma and its application to materials processing
    • 批准号:
      21360356
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $11.56万
    • 财政年份:
      2009
    • 负责人:
      TERASHIMA Kazuo
    • 依托单位:
    Creation of solution plasma controlled in nano space and Its application to materials processing
    • 批准号:
      19360326
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $13.06万
    • 财政年份:
      2007
    • 负责人:
      TERASHIMA Kazuo
    • 依托单位:
    海外基金