Nano MOSFET Fluctuations and Device Integrity
Nano MOSFET Fluctuations and Device Integrity
批准号:
18063006
负责人:
HIRAMOTO Toshiro
金额:
$32.77万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research on Priority Areas
财政年份:
2006
资助国家:
日本
项目状态:
已结题
起止时间:
2006 至 2009
中文摘要
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英文摘要
Random variability has been studied by measurements and simulation. It has been clarified that SOI MOSFETs with very thin buried oxide is less sensitive to random dopant fluctuations. A new method of self-suppression of variability after chip fabrication has been proposed and its validity has been demonstrated by simulation.
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DOI:
--
发表时间:
2010
期刊:
影响因子:
--
作者:
[Yutaro, Mukudai・Tomotsugu, Shimokawa・Akihiro, Nakatani, T.Hiramoto]
通讯作者:
T.Hiramoto
Improvement of Static Noise Margin in SRAM by Post-Fabrication Self-Convergence Technique
通过后加工自收敛技术改善 SRAM 中的静态噪声容限
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[M.Suzuki, T.Saraya, K.Shimizu, T.Sakurai, T.Hiramoto]
通讯作者:
T.Hiramoto
Improvement of Static Noise Margin SRAM by Post-Fabrication Self-Convergence Technique
利用后加工自收敛技术改进静态噪声容限SRAM
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[M.Suzuki, T.Saraya, K.Shimizu, T.Sakurai, T.Hiramoto, Makoto Suzuki]
通讯作者:
Makoto Suzuki
Vth Dependence of Vth Variability in Intrinsic Channel SOI MOSFETs with Ultra-Thin BOX
具有超薄 BOX 的本征通道 SOI MOSFET 中 Vth 变化的 Vth 依赖性
DOI:
--
发表时间:
2009
期刊:
影响因子:
--
作者:
[C.Lee, A.T.Putra, K.Shimizu, T.Hiramoto]
通讯作者:
T.Hiramoto
Random Vth Variation Induced by Gate Edge Fluctuations in Nanoscale MOSFETs
纳米级 MOSFET 中栅极边缘波动引起的随机 Vth 变化
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[A.T.Putra, A.Nishida, S.Kamohara, T.Hiramoto]
通讯作者:
T.Hiramoto
共 53 条
Basic research on influence of single impurity atom on statistics of nanoscale transistor characteristics
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批准号:26630148
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项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.5万
-
财政年份:2014
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Basic research on ultra-low voltage MOS transistors aiming at sub-100mV operation
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批准号:25630135
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
-
财政年份:2013
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负责人:HIRAMOTO Toshiro
-
依托单位:
A research on silicon nano-devices for single-electron, quantum, CMOS integrated circuits operating at room temperature
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批准号:16201029
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$31.7万
-
财政年份:2004
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负责人:HIRAMOTO Toshiro
-
依托单位:
Exploration of Physics and Integration of Nano-Scale MOSEFET with Suppressed Fluctuations
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批准号:13450135
-
项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.47万
-
财政年份:2001
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Fabrication of Silicon Nano-Devices with High Controllability beyond Lithography Limit
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批准号:10450112
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$8.7万
-
财政年份:1998
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负责人:HIRAMOTO Toshiro
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依托单位:
Study on Performance Increase and Fluctuation Suppression in Thin Film SOI MOSFET by utilizing quantum effects
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批准号:10555117
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项目类别:Grant-in-Aid for Scientific Research (B).
-
资助金额:$8.06万
-
财政年份:1998
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负责人:HIRAMOTO Toshiro
-
依托单位:
Investigation of Oxidation Mechanisms in SOI Structures
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批准号:08455161
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$4.86万
-
财政年份:1996
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Fluctuations of Characteristics in Sub-0.1mum Thin Film SOI CMOS LSI Devices
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批准号:07555109
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项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$6.78万
-
财政年份:1995
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负责人:HIRAMOTO Toshiro
-
依托单位: