A research on silicon nano-devices for single-electron, quantum, CMOS integrated circuits operating at room temperature
A research on silicon nano-devices for single-electron, quantum, CMOS integrated circuits operating at room temperature
批准号:
16201029
负责人:
HIRAMOTO Toshiro
金额:
$31.7万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
2004
资助国家:
日本
项目状态:
已结题
起止时间:
2004 至 2007
中文摘要
点击翻译按钮获取中文摘要
英文摘要
This research aims at a new concept of integrate circuit in which new functional devices utilizing single-electron/quantum effect and conventional CMOS devices are merged operating at room temperature. At first, the fabrication process of single-electron transistors was developed. The world largest peak-to-valley current ratios of Coulomb blockade oscillations and negative differential conductance at room temperature were successfully obtained. Furthermore, the precise control of the peak position of the Coulomb blockade oscillations was achieved for the first time in single-hole transistors which have very small quantum dots. The unique characteristics originate from large quantum energy spacing in the quantum dot. Next, the integration of single-electron transistors operating at room temperature was pursued. The process conditions were finely tuned and finally, the single-electron transistors operating at room temperature were successfully integrated for the first time. Moreover, analog pattern matching circuits were fabricated by integrating single-electron transistors and their operations were demonstrated at room temperature.
期刊论文(264)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
Control of full width at half maximum of Coulomb oscillation in silicon single-hole transistors at room temperature
室温下硅单孔晶体管库仑振荡半峰全宽的控制
DOI:
--
发表时间:
2007
期刊:
Applied Physics Letters Vol. 91, No. 5
影响因子:
--
作者:
[Kousuke Miyaji, Toshiro Hiramoto]
通讯作者:
Toshiro Hiramoto
Experimental Study on Quantum Structure of Silicon Nano Wire and Its Impact on Nano Wire MOSFET and Single-Electron Transistor
硅纳米线量子结构及其对纳米线MOSFET和单电子晶体管影响的实验研究
DOI:
--
发表时间:
2006
期刊:
影响因子:
--
作者:
[Masaharu, Kobayashi, Toshiro Hiramoto]
通讯作者:
Toshiro Hiramoto
Mobility Degradation in (110)-Oriented Ultra-thin Body Double-Gate pMOSFETs with SOI Thickness of less than 5nm
SOI 厚度小于 5nm 的 (110) 取向超薄体双栅极 pMOSFET 中的迁移率下降
DOI:
--
发表时间:
2007
期刊:
影响因子:
--
作者:
[Ken Shimizu, Toshiro Hiramoto]
通讯作者:
Toshiro Hiramoto
DOI:
10.1109/iedm.2007.4419046
发表时间:
2007-12
期刊:
2007 IEEE International Electron Devices Meeting
影响因子:
--
作者:
[K. Shimizu;T. Hiramoto]
通讯作者:
K. Shimizu;T. Hiramoto
Si Nanoelectronics - Single-Electron Transistors and Other Nano Devices -
硅纳米电子学 - 单电子晶体管和其他纳米器件 -
DOI:
--
发表时间:
2004
期刊:
影响因子:
--
作者:
[S.J.Li, Y.Suzuki, M.Noori, 藤目ゆき, 坂内 徳明, 木村秀雄, Yasushi Hazama, 藤目ゆき, T. Hiramoto]
通讯作者:
T. Hiramoto
共 90 条
Basic research on influence of single impurity atom on statistics of nanoscale transistor characteristics
-
批准号:26630148
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.5万
-
财政年份:2014
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Basic research on ultra-low voltage MOS transistors aiming at sub-100mV operation
-
批准号:25630135
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.58万
-
财政年份:2013
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Nano MOSFET Fluctuations and Device Integrity
-
批准号:18063006
-
项目类别:Grant-in-Aid for Scientific Research on Priority Areas
-
资助金额:$32.77万
-
财政年份:2006
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Exploration of Physics and Integration of Nano-Scale MOSEFET with Suppressed Fluctuations
-
批准号:13450135
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$9.47万
-
财政年份:2001
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Fabrication of Silicon Nano-Devices with High Controllability beyond Lithography Limit
-
批准号:10450112
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$8.7万
-
财政年份:1998
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Study on Performance Increase and Fluctuation Suppression in Thin Film SOI MOSFET by utilizing quantum effects
-
批准号:10555117
-
项目类别:Grant-in-Aid for Scientific Research (B).
-
资助金额:$8.06万
-
财政年份:1998
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Investigation of Oxidation Mechanisms in SOI Structures
-
批准号:08455161
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$4.86万
-
财政年份:1996
-
负责人:HIRAMOTO Toshiro
-
依托单位:
Fluctuations of Characteristics in Sub-0.1mum Thin Film SOI CMOS LSI Devices
-
批准号:07555109
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$6.78万
-
财政年份:1995
-
负责人:HIRAMOTO Toshiro
-
依托单位:
国内基金
海外基金
登录
查看更多内容
空间辐射环境下沟槽型SiC MOSFET器件栅氧长期可靠性研究
-
批准号:2026JJ60454
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2026
-
负责人:桂庆忠
-
依托单位:
SiC MOSFET瞬态开关建模与开关振荡抑制研究
-
批准号:
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2025
-
负责人:于安宁
-
依托单位:
SiC MOSFET器件多时间尺度电热应力栅极主动控制研究
-
批准号:JCZRQT202500104
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2025
-
负责人:
-
依托单位:
高可靠 4H-SiC MOSFET 能带调控机理与低沟道势垒
新结构研究
-
批准号:2024JJ5044
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2024
-
负责人:吴丽娟
-
依托单位:
车规级碳化硅MOSFET阈值漂移规律及其抑制方法研究
-
批准号:
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2024
-
负责人:蒋华平
-
依托单位:
舰船电源应用背景下的 SiC MOSFET/SiIGBT
拓扑混合模块辐射干扰预测研究
-
批准号:TGS24E070005
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2024
-
负责人:彭子舜
-
依托单位:
极端温度环境下MOSFET器件模型和可靠性研究
-
批准号:
-
项目类别:省市级项目
-
资助金额:15.0万元
-
批准年份:2024
-
负责人:杜江锋
-
依托单位:
基于SiC/GaN异质结的垂直型功率MOSFET导通及击穿机制研究
-
批准号:
-
项目类别:省市级项目
-
资助金额:10.0万元
-
批准年份:2023
-
负责人:刘超
-
依托单位:
SiC MOSFET单粒子辐照损伤机理与加固结构研究
-
批准号:
-
项目类别:省市级项目
-
资助金额:10.0万元
-
批准年份:2023
-
负责人:邓小川
-
依托单位:
具有集成肖特基二极管的逆导型氧化镓MOSFET机理与实验研究
-
批准号:62374028
-
项目类别:面上项目
-
资助金额:48万元
-
批准年份:2023
-
负责人:魏杰
-
依托单位: