Development of the 'Super-Dimpler' for preparation of a thin specimen for TEM observations of the machined surfaces.
Development of the 'Super-Dimpler' for preparation of a thin specimen for TEM observations of the machined surfaces.
批准号:
02555017
负责人:
SUGA Tadatomo
金额:
$5.18万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Developmental Scientific Research (B)
财政年份:
1990
资助国家:
日本
项目状态:
已结题
起止时间:
1990 至 1991
中文摘要
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英文摘要
In observation using, transmission electron microscope(TEM), we spent a lot of time to prepare thin film specimens, for they must be thin enourgh to be transmitted by electron beam and their surfaces need to be flat. Especially ceramics is usually chemically stable, so tfiat the ion-thinninc, method is used for making, its TEM specimens. However, this method has many problems, such as a damaging and rouaheriing at the surface by the ion beam attackin.In this research, we make on an experimental basis a auto-polishin, machine with submicron position control mechanism and establish a preparation technolooy of damage-free specimen for TEM observation only by mechanical thinninal thinning.First of all, surface damage, e morpholo, , y produced by some conventional thinning methods (ariseding, polishing with diamond abrasive, and polishing by a dimpler) are estimated usincr TEM. Both the ground surface and the dimpler polished surface has severe residual stress with a crack both in grains and grain boundaries. And the diamond polished surface has many scratches. Therefore these methods are not suitable for makinc, TEM specimens.Then, a 'Super Dimpler' using a new concept on basis of the strain-free mechanochemical polishincr is designed and developed. Its processing mechanism is followed ; A disk rotating, at above 10^4 rpm in a polishing solution is approached to a specimen with keeping them apart. Abrasive in solution flowing between the disk and the specimen at high speed polish the specimen surface.Polishing with alumina abrasive showed that removine, proceeded in the non-contact state. This means that the dimple pattem processing, using mechanochemical polishing, is available. For the future, we can prepare thin film specimens for TEM observations which have no surface damage at short processing, time.
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Y. Takahashi, M. Kikuchi, S. Suzuki, and T. Suga: "Transmission Electron Microscopy of Surface Damages Resulting from Wet Polishing in a polycrystalline Aluminium Nitride Substrate" Journal of the Ceramics Society of Japan. 99. 613-619 (1991)
Y. Takahashi、M. Kikuchi、S. Suzuki 和 T. Suga:“多晶氮化铝基板湿式抛光造成的表面损伤的透射电子显微镜”日本陶瓷学会杂志。
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M.Kikuchi,Y.Takahashi,T.Suga,S.Suzuki,and Y.Bando: "Mechanochemical Polishing of Silicon Carbide Single Crystal with Chromium (III) Oxide Abrasive" Journal of the American Ceramics Society. 75. 189-194 (1992)
M.Kikuchi、Y.Takahashi、T.Suga、S.Suzuki 和 Y.Bando:“用氧化铬 (III) 磨料对碳化硅单晶进行机械化学抛光”美国陶瓷学会杂志。
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M. kikuchi, Y. Takahashi, T. Suga, S. Suzuki, and Y. Bando: "Mechanochemical Polishing of Silicon Carbide Single Crystal with Chromium (III) Oxide Abrasive" Journal of the American Ceramics Society. 75. 189-194 (1992)
M. kikuchi、Y. Takahashi、T. Suga、S. Suzuki 和 Y. Bando:“用氧化铬 (III) 磨料对碳化硅单晶进行机械化学抛光”美国陶瓷学会杂志。
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通讯作者:
M.Kikuchi,Y.takahashi,T.Suga,S.Suzuki,and Y.Bando: "Mechanochemical Polishing of Silicon Carbide Single Crystal with Chromium(III)Oxide Abrasive" Journal of the American Ceramics Society. 75. 189-194 (1992)
M.Kikuchi、Y.takahashi、T.Suga、S.Suzuki 和 Y.Bando:“用氧化铬 (III) 磨料对碳化硅单晶进行机械化学抛光”美国陶瓷学会杂志。
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M.Kikuchi,Y.Takahashi,S.Suzuki,T.Suga and Y.Bando: "Direct Evidence of Mechanochemical Polishing by Cr_2O_3 Abrasive in SiC Single Crystal" Journal of American Ceramics Society.
M.Kikuchi、Y.Takahashi、S.Suzuki、T.Suga 和 Y.Bando:“SiC 单晶中 Cr_2O_3 磨料机械化学抛光的直接证据”美国陶瓷学会杂志。
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