Investigation of the growing surfaces of crystal by X-ray scattering at small glancing angle incidence

A compact ultrahigh-vacuum X-ray diffractometer was designed and constructed using a small rotating-anode X-ray source of 18kW.Its UHV specimen chamber is 200 mm high and 140 mm in diameter and can be evacuated up to 3*10^&lt；-8&gt；Pa.The X-ray is incident into the chamber through a thin Be window，0.2 mm thick and 30 mm in diameter.Diffracted and scattered X-rays are taken out through another Be window，0.4 mm thick and 60 mm in diameter.All the equipments，a rotating-anode X-ray source，an incident monochromator，and a two-circle diffractometer onto which a UHV specimen chamber and a conventional scintillation counter are mounted，are arranged on only one optical table，70 cm wide and 90 cm in length。Configuration of the specimen holder in the chamber，which is designed for the surface glancing angle scatterings at present，can be controlled from outside of the vacuum。The UHV chamber has two evaporation cells for specimen preparation and a heater to anneal the specimen.This arrangement allows us to perform in situ observations of the growing crystal surfaces during the deposition by means of glancing angle X-ray scattering method.A preliminary experiment of the glancing angle scattering of mechanically polished silver polycrystal surfaces gave an order of 10^3count·sec^&lt；-1&gt；of scattered X-rays intensity at its specular reflection angle，which is enough to derive a significant of the growing crysting of the scrays intensity at its specular reflection angleWe success to perform in situ observation of layr-by-layr growth of PbSe(111)by surface X-ray scattering with the use of X-ray from the small rotating-anode X-ray source of 18kW。

A compact ultrahigh-vacuum X-ray diffractometer was designed and constructed using a small rotating-anode X-ray source of 18kW.Its UHV specimen chamber is 200mm high and 140mm in diameter and can be evacuated up to 3*10^<-8> Pa. The X-ray is incident into the chamber through a thin Be window, 0.2mm thick and 30mm in diameter. Diffracted and scattered X-rays are taken out through another Be window, 0.4mm thick and 60mm in diameter. All the equipments, a rotating-anode X-ray source, an incident monochromator, and a two-circle diffractometer onto which a UHV specimen chamber and a conventional scintillation counter are mounted, are arranged on only one optical table, 70cm wide and 90cm in length. Configuration of the specimen holder in the chamber, which is designed for the surface glancing angle scatterings at present, can be controlled from outside of the vacuum. The UHV chamber has two evaporation cells for specimen preparation and a heater to anneal the specimen. This arrangement allows us to perform in situ observations of the growing crystal surfaces during the deposition by means of glancing angle X-ray scattering method.A preliminary experiment of the glancing angle scattering of mechanically polished silver polycrystal surfaces gave an order of 10^3 count・sec^<-1> of scattered X-rays intensity at its specular reflection angle, which is enough to derive a significant interpretation of the surface structure.The next experiment was estimation of the growing surface of PbSe (111) by means of glancing angle X-ray scattering method. We success to perform in situ observation of layr-by-layr growth of PbSe (111) by surface X-ray scattering with the use of X-ray from the small rotating-anode X-ray source of 18kW.