Development of Light-Emitting Devices Based on Poly-crystalline Silicon Films and Application to Large-Area Display

基于多晶硅薄膜的发光器件的研制及其在大面积显示中的应用

基本信息

项目摘要

To develop large-area light-emissive flat panel display devices, light-emitting porous silicon diodes have been fabricated using studied for poly-crystalline silicon (poly-Si) films. The characteristics of poly-Si devices as light-emitting diodes (LED) are clarified. The major results and their significances are summarized as follows.1. Process technology of poly-Si-based LEDsAppropriate dervice confifuration of poly-Si diodes as LEDs was determined by detailed investigations of the anodization conditions of poly-Si films, sstructuring of the active layr, formation of injection electrodes. On a basis of these studies, poly-Si LEDs with an efficiency comparable to that of conventional porous silicon diodes foramed on single-crystlline substrates were successfully obtained.2. Charaacteristics of poly-Si-based LEDsForm some electrical and optical measurements, it has been shown that the electroluminescence (EL) in porous poly-Si diodes is based on the same injection mechanism as in the case of single-crystalline substrates. Advantageous features of porous poly-Si diodes over the conventional porous silicon ones were made clear regarding the stability and uniformity of the EL emission.3. Fundamental aspects toward large-area display devicesThe compatibilty of poorous poly-Si LEDs with a poly-Si thin film transistor was examined using a planar-type poly-Si TFT fabricated on the glass substrate based on a laser annealing technique. As the gate voltage is increased under a constant drain voltage, the driving current was supplied into the LRDs, and then significant EL emission was observed through the top contact. This result indicates the posiibility of porous poy-Si as an active component for integrated LED arrays on glass substrates with a large-area.
为了开发大面积发光平板显示器件,采用多晶硅薄膜制备了多孔硅发光二极管。阐明了多晶硅器件作为发光二极管(LED)的特点。本文的主要结果和意义概括如下:1.本文的主要研究成果和研究意义。多晶硅LED的工艺技术通过对多晶硅薄膜的阳极氧化条件、有源层的结构、注入电极的形成等方面的详细研究,确定了适合作为LED的多晶硅二极管的工艺配置。在这些研究的基础上,成功地获得了与传统单晶衬底多孔硅二极管相当的效率的多晶硅LED。多孔多晶硅发光二极管的特性通过一些电学和光学测量表明,多孔多晶硅二极管的电致发光(EL)是基于与单晶衬底相同的注入机制。在发光的稳定性和均匀性方面,说明了多孔多晶硅二极管相对于传统多孔硅二极管的优势。研究了多孔多晶硅LED与多晶硅薄膜晶体管的兼容性,使用基于激光退火法在玻璃衬底上制备的平面型多晶硅TFT来检测多孔多晶硅LED与多晶硅薄膜晶体管的兼容性。当栅极电压在恒定的漏极电压下增加时,驱动电流被提供给LRD,然后通过顶部接触观察到显著的EL发射。这一结果表明,多孔POY-Si作为大面积玻璃基板上集成LED阵列的有源元件是可能的。

项目成果

期刊论文数量(48)
专著数量(0)
科研奖励数量(0)
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专利数量(0)
T.Matsumoto, Y.Masumoto, T.Nakagawa, M.Hashimoto, K.Ueno, and N.Koshida: "Electroluminescence from deuterium-terininated porous silicon" Jpn.J.Appl.Phys.36,. L1089-L1091 (1997)
T.Matsumoto、Y.Masumoto、T.Nakakawa、M.Hashimoto、K.Ueno 和 N.Koshida:“氘封端多孔硅的电致发光”Jpn.J.Appl.Phys.36,。
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T.Nakagawa, H.Koyama, and N.Koshida: "Control of structure and opticalanisotropy of luminescent porous silicon by magnetic-field assistec anodization," Appl.Phys.Lett.69. 3206-3208 (1996)
T.Nakakawa、H.Koyama 和 N.Koshida:“通过磁场辅助阳极氧化控制发光多孔硅的结构和光学各向异性”Appl.Phys.Lett.69。
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H.Mizuno, H, Koyama, and N.Koshida: "Oxide-Free Blue Photoluminescence from Photochemicall Etched Porous Silicon" Appl.Phys.Lett.69. 3779-3781 (1996)
H.Mizuno、H、Koyama 和 N.Koshida:“光化学蚀刻多孔硅的无氧化物蓝色光致发光”Appl.Phys.Lett.69。
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H.Koyama, N.Shima, and N.Koshida: "Large and irregular shift of photoluminescence excitaion spectra observed in photochemically etched porous silicon" Phys.Rev.B. 53(20). R13291-R13294 (1996)
H.Koyama、N.Shima 和 N.Koshida:“在光化学蚀刻多孔硅中观察到的光致发光激发光谱的大且不规则的变化”Phys.Rev.B。
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K.Ueno, H.Koyama, and N,Koshida: "Nonlinear electrical functions of porous silicon lightemitting diodes" Mat.Res.Soc.Symp.Proc.452. 699-704 (1997)
K.Ueno、H.Koyama 和 N,Koshida:“多孔硅发光二极管的非线性电函数”Mat.Res.Soc.Symp.Proc.452。
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KOSHIDA Nobuyoshi其他文献

KOSHIDA Nobuyoshi的其他文献

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{{ truncateString('KOSHIDA Nobuyoshi', 18)}}的其他基金

Applications of nanosiicon ballistic emitter in liquids, gases, and solids
纳米硅弹道发射器在液体、气体和固体中的应用
  • 批准号:
    21241037
  • 财政年份:
    2009
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Clarifying the Photonic, Electronic, and Acoustic Characteristics of Quantum-sized Silicon for Functional Integration
阐明用于功能集成的量子尺寸硅的光子、电子和声学特性
  • 批准号:
    18206039
  • 财政年份:
    2006
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Control of physical properties induced in silicon nanostructure and device applications
控制硅纳米结构和器件应用中引起的物理特性
  • 批准号:
    18063007
  • 财政年份:
    2006
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for Scientific Research on Priority Areas
Ballistic Electron Effect in Nanocrystalline Silicon and its Device Applications
纳米晶硅中的弹道电子效应及其器件应用
  • 批准号:
    15201031
  • 财政年份:
    2003
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Development of Silicon-Based Surface-Emitting Ballistic Electron Source and Its Application to Flat Panel Display
硅基面发射弹道电子源的研制及其在平板显示中的应用
  • 批准号:
    13355016
  • 财政年份:
    2001
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
A Study on Haptic Interfaces
触觉界面研究
  • 批准号:
    11450160
  • 财政年份:
    1999
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for Scientific Research (B)
Development and Photonic Integration of Efficient and Stable Silicon-Based LED
高效稳定硅基LED的开发与光子集成
  • 批准号:
    10355015
  • 财政年份:
    1998
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Study of Visible Luminescence Mechanism in Porous Silicon and Its Devvelopment into Silicon-Based Optoelectronic Integration
多孔硅可见光发光机理研究及其硅基光电集成开发
  • 批准号:
    07405016
  • 财政年份:
    1995
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for Scientific Research (A)
Ultafine Lithography by Oxide Ion Resists and Its Applications.
氧化物离子抗蚀剂超精细光刻及其应用。
  • 批准号:
    01550304
  • 财政年份:
    1989
  • 资助金额:
    $ 11.33万
  • 项目类别:
    Grant-in-Aid for General Scientific Research (C)

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通过阳极氧化在超弹性 NiTi 合金上形成 TiO2 层
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贵金属合金纳米颗粒阳极氧化过程的形成行为及其控制与应用研究
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