Study of Visible Luminescence Mechanism in Porous Silicon and Its Devvelopment into Silicon-Based Optoelectronic Integration
Study of Visible Luminescence Mechanism in Porous Silicon and Its Devvelopment into Silicon-Based Optoelectronic Integration
批准号:
07405016
负责人:
KOSHIDA Nobuyoshi
金额:
$21.82万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1995
资助国家:
日本
项目状态:
已结题
起止时间:
1995 至 1997
中文摘要
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英文摘要
To enhance the scientific and teachnological potential of silicon-based optoelectronics, the visible luminescence mechanism of porous silicon(PS)has been studied, including the device physics for monolithic photonic integrataion. Major results are summarized as fofllows.1. Related issues to luminescence mechanism(1) Bandgap widening occurs in luminescent PS,while its electronic and lattice structures maintain characteristic features of single-crystal silicon substrates.(2) Definite correlation exists between bandgap and PL peak energy.(3) Nanocrystal-related PL model is presented on a basis of spectroscopic analyzes of PL dynamics, polarization memory, and PL excitation process.(4) PL spestra can be continuously tuned from red to blue simply by post-anodization photochemical etching without any further treatments like thermal oxidation.(5) PL efficiency and stability can be improved by appropriate control of structure and surface termination of silicon nanocrystals in PS.2. Fundamentals of integrated photonic devices(1) By analyzes of electroluminescence (EL) mechanism in PS diodes, efficiency of 0.05% was obtained from diodes with a simple PS layr.(2) Applicability of PS to optical cavity and three-dimensionally buried waveguide was demonstrated based on monolithic fabricataion technology.(3) Availabilty of PS for optical logic gate was made clear by making use of non-linear optical effects.(4) Some useful functions of PS as a confined system were observed in relation to the EL emission. Especially of importances are bistable memory effects and ballistic electron emission.
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M.Araki, H.Koyama, and N.Koshida: "Fabrication and Fundamental Properties of an Edge-Emitting Device with Step-Index Porous Silicon Waveguide" Appl.Phys.Lett. 68. in press (1996)
M.Araki、H.Koyama 和 N.Koshida:“具有阶跃折射率多孔硅波导的边缘发射器件的制造和基本特性”Appl.Phys.Lett。
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H.Mizuno, H.Koyama, and N.Koshida: "Photo-assisted continuous tuning of photoluminescence spectra of porous silicon," Thin Solid Films. 297. 61-63 (1997)
H.Mizuno、H.Koyama 和 N.Koshida:“多孔硅光致发光光谱的光辅助连续调谐”,薄固体薄膜。
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T.Nakagawa, H.Koyama, and N.Koshida: "Effects of external magnetic field on the formation and optical properties of porous silicon," Proc.Int.ECS Symp.on Pits and Pores:Formation,Properties and Significance for Advanced Luminesecnt Materials,Ottawa,1997(E
T.Nakakawa、H.Koyama 和 N.Koshida:“外部磁场对多孔硅的形成和光学性质的影响”,Proc.Int.ECS Symp.on Pits and Pores:Formation,Properties and Significance for Advanced Luminesecnt
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M.Araki, H.Koyama, and N.Koshida: "Controlled electroluminescence of porous silicon diodes with a vertical optical cafvity" Appl.Phys.Lett.52. 2956-2958 (1996)
M.Araki、H.Koyama 和 N.Koshida:“具有垂直光学腔的多孔硅二极管的受控电致发光”Appl.Phys.Lett.52。
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H.Mizuno, H, Koyama, and N.Koshida: "Oxide-Free Blue Photoluminescence from Photochemicall Etched Porous Silicon" Appl.Phys.Lett.69. 3779-3781 (1996)
H.Mizuno、H、Koyama 和 N.Koshida:“光化学蚀刻多孔硅的无氧化物蓝色光致发光”Appl.Phys.Lett.69。
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共 54 条
Applications of nanosiicon ballistic emitter in liquids, gases, and solids
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批准号:21241037
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$13.4万
-
财政年份:2009
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负责人:KOSHIDA Nobuyoshi
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依托单位:
Clarifying the Photonic, Electronic, and Acoustic Characteristics of Quantum-sized Silicon for Functional Integration
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批准号:18206039
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$31.28万
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财政年份:2006
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负责人:KOSHIDA Nobuyoshi
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依托单位:
Control of physical properties induced in silicon nanostructure and device applications
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批准号:18063007
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$26.62万
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财政年份:2006
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负责人:KOSHIDA Nobuyoshi
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依托单位:
Ballistic Electron Effect in Nanocrystalline Silicon and its Device Applications
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批准号:15201031
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$28.62万
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财政年份:2003
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负责人:KOSHIDA Nobuyoshi
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依托单位:
Development of Silicon-Based Surface-Emitting Ballistic Electron Source and Its Application to Flat Panel Display
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批准号:13355016
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$26.71万
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财政年份:2001
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负责人:KOSHIDA Nobuyoshi
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依托单位:
A Study on Haptic Interfaces
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批准号:11450160
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$7.68万
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财政年份:1999
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负责人:KOSHIDA Nobuyoshi
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依托单位:
Development and Photonic Integration of Efficient and Stable Silicon-Based LED
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批准号:10355015
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$15.68万
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财政年份:1998
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负责人:KOSHIDA Nobuyoshi
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依托单位:
Development of Light-Emitting Devices Based on Poly-crystalline Silicon Films and Application to Large-Area Display
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批准号:08555083
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$11.33万
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财政年份:1996
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负责人:KOSHIDA Nobuyoshi
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依托单位:
Ultafine Lithography by Oxide Ion Resists and Its Applications.
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批准号:01550304
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项目类别:Grant-in-Aid for General Scientific Research (C)
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资助金额:$1.15万
-
财政年份:1989
-
负责人:KOSHIDA Nobuyoshi
-
依托单位:
海外基金