Single Electron Devices Based on NeoSilicon Materials
Single Electron Devices Based on NeoSilicon Materials
批准号:
11355014
负责人:
ODA Shunri
金额:
$23.12万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (A)
财政年份:
1999
资助国家:
日本
项目状态:
已结题
起止时间:
1999 至 2001
中文摘要
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英文摘要
A novel man-made material, NeoSilicon, is proposed. In NeoSilicon, both particle size and interparticle distance of nanocrystalline silicon quantum dots are precisely controlled. New functions in electron transport, photon emission and electron emission are expected due to quantum effect at room temperature and large interaction between dots. The bandgap is determined by the particle size. The conductivity is controlled mainly by tunneling distance. The transport characteristics are also controlled by charge quantization effect.NeoSilicon is expected to be widely applicable to the key devices in electronics, including ultra-large-scale-integrated circuits, thin-film-transistors for liquid crystal displays and solar cells. Moreover, new field in electronics by using single electron devices, light emitting diodes, laser diodes, flat field-emission-devices and quantum cellular automata would be realized by NeoSilicon.In order to implement NeoSilicon, precise control of particle size of 3- … More 5 nm and interparticle distance of 1-2 nm is essential. Using pulsed plasma processes, we have successfully prepared nanocrystalline silicon particles of 8 nm in diameter with size dispersion of 1nm, whose surfaces are covered by naturally formed oxide of 1.5 nm thickness. Major challenges include reduction of particle size by means of variation of pulsed-plasma processing conditions. Direct nitridation would be a promising method for the formation of tunneling barrier, since lower barrier height for nitride allows larger tunneling probability and self-limiting mechanism of nitride formation provides high accuracy control of interparticle distance.Electrical properties of nanocrystalline silicon particles have been investigated by employing nanoscale electrodes, both planar and vertical configurations, prepared by electron-beam lithography. Coulomb blockade and Coulomb oscillations predominantly due to a single quantum dot are readily modeled as well as interactions of electrons between neighboring dots. Less
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B. J. Hinds, T. Yamanaka and S. Oda: "Charge Storage Mechanism in Nano-crystalline Si Based Single Electron Memories"Materials Research Society Symposium Proceedings. 638. F2.2.1-F2.2.6 (2001)
B. J. Hinds、T. Yamanaka 和 S. Oda:“纳米晶硅基单电子存储器中的电荷存储机制”材料研究学会研讨会论文集。
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J.Omachi,R.Nakamura,K.Nishiguchi and S.Oda: "Retardation in the oxidation rate of nanocrystalline silicon quantum dots"Materials Research Society Symposium Proceedings. (in press). (2001)
J.Omachi、R.Nakamura、K.Nishiguchi 和 S.Oda:“纳米晶硅量子点氧化速率的延迟”材料研究学会研讨会论文集。
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A.Dutta,and S.P.Lee,S.Hatatani and S.Oda: "Silicon Based Single Electron Memory Using Multi-Tunnel Junction Fabricated by Electorn Beam Direct Writing"Applied Physics Letters. 75. 1422-1424 (2000)
A.Dutta、S.P.Lee、S.Hatatani 和 S.Oda:“使用电子束直接写入制造的多隧道结的硅基单电子存储器”应用物理快报。
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K. Nishiguchi, S. Hara, T. Amano, S. Hatatani and S. Ode: "Preparation of Nanocrystalline Silicon Quantum Dots by Pulsed Plasma Processes with High Deposition Rates"Materials Research Society Symposium Proceedings. 571. 43-48 (2000)
K. Nishiguchi、S. Hara、T. Amano、S. Hatatani 和 S. Ode:“通过高沉积速率的脉冲等离子体工艺制备纳米晶硅量子点”材料研究学会研讨会论文集。
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B. J. Hinds, T. Yamanaka and S. Oda: "Emission Lifetime of Polarizable Charge Stored in Nano-Crystalline Si Based Single Electron Memory"Journal of Applied Physics. 90(12). 6402-6408 (2001)
B. J. Hinds、T. Yamanaka 和 S. Oda:“基于纳米晶硅的单电子存储器中存储的可极化电荷的发射寿命”应用物理学杂志。
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共 92 条
Fabrication of Nanoscale Devices and Circuits using DNA Origami Technology
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批准号:24656201
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
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财政年份:2012
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负责人:ODA Shunri
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依托单位:
Precise position control of silicon quantum dots and fabrication of quantum information devices.
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批准号:22246040
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$31.2万
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财政年份:2010
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负责人:ODA Shunri
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依托单位:
Integrated Assembly of NeoSilicon towards Quantum Information Devices
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批准号:19206035
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$31.37万
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财政年份:2007
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负责人:ODA Shunri
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依托单位:
Self-assembled integration technologies of silicon quantum dots toward future NeoSilicon quantum information devices
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批准号:16206030
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$32.28万
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财政年份:2004
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负责人:ODA Shunri
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依托单位:
Atomic scale control of high-k dielectric ultrathin film grown by atomic layer-by-layer MOCVD with using in situ spectroscopic ellipsometry monitoring
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批准号:14350160
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.66万
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财政年份:2002
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负责人:ODA Shunri
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依托单位:
Control of Particle Size and Position of Nano-crystalline Silicon
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批准号:11450008
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$9.47万
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财政年份:1999
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负责人:ODA Shunri
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依托单位:
STUDY OF ULTRA-THIN-FILM/ULTRA-FINE-STRUCTURE DEVICES
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批准号:10044138
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项目类别:Grant-in-Aid for Scientific Research (A).
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资助金额:$5.31万
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财政年份:1998
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负责人:ODA Shunri
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依托单位:
Fabnication of Superconductor/Insulator/Superconductor Trilayer Tunnel Junction Devices by Atomic Layer MOCVD
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批准号:08555004
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$8.45万
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财政年份:1996
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负责人:ODA Shunri
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依托单位:
STUDY OF ULTRA-THIN-FILM/ULTRA-FINE-STRUCTURE DEVEICES
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批准号:08044134
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$6.4万
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财政年份:1996
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负责人:ODA Shunri
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依托单位:
Study of Ultra-Thin-Film/Ultra-Fine-Structure Devices
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批准号:06044076
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$5.44万
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财政年份:1994
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负责人:ODA Shunri
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依托单位:
Study of Ultra-Thin-Film/Ultra-Fine-Structure Devices
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批准号:04044062
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项目类别:Grant-in-Aid for international Scientific Research
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资助金额:$5.25万
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财政年份:1992
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负责人:ODA Shunri
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依托单位: