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Atomically-control of halfmetal/Si interface for spin-transistors

Atomically-control of halfmetal/Si interface for spin-transistors
自旋晶体管半金属/硅界面的原子控制
批准号:
22360127
负责人:
MIYAO Masanobu
金额:
$11.9万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2012

项目摘要

项目成果

MIYAO Masanobu的其他基金

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中文摘要
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英文摘要
To achieve Si-based spin-transistors, a new epitaxial growth technique of half-metal on Si has been developed. Moreover, by optimizing the electrical transport properties at half-metal/Si interfaces, injection of spin-polarized electrons has been realized at room temperature.
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会议论文
HEPESによるFe3Si/Geヘテロ構造の評価
通过 HEPES 评估 Fe3Si/Ge 异质结构
DOI: --
发表时间: 2013
期刊:
影响因子: --
作者: [I. Yamamoto, M. Nakano, T. Yanai, H. Fukunaga, 松本宏哉]
通讯作者: 松本宏哉
DOI: 10.1063/1.3368701
发表时间: 2010-04
期刊: Applied Physics Letters
影响因子: 4
作者: [K. Yamane;K. Hamaya;Y. Ando;Y. Enomoto;Keisuke Yamamoto;T. Sadoh;M. Miyao]
通讯作者: K. Yamane;K. Hamaya;Y. Ando;Y. Enomoto;Keisuke Yamamoto;T. Sadoh;M. Miyao
(Invited) Hybrid- Formation of Ge-on-Insulator Structures on Si Platform by SiGe-Mixing-Triggered Rapid-Melting Growth --- A Road to Artificial Crystal ---
(特邀)SiGe混合触发快速熔融生长在Si平台上混合形成Ge绝缘体结构——人造晶体之路——
DOI: 10.1149/05005.0059ecst
发表时间: 2013
期刊: ECS Transactions
影响因子: --
作者: [M. Miyao, M. Kurosawa, K. Toko, Y. Tojo, and T. Sadoh]
通讯作者: and T. Sadoh
Low-temperature grown quaternary Heusler compound Co_2Mn_<1-x>Fe_xSi films on Ge(111)
Ge(111)上低温生长四元Heusler化合物Co_2Mn_<1-x>Fe_xSi薄膜
DOI: --
发表时间: 2011
期刊: Journal of Applied Physics
影响因子: 3.2
作者: [S.Yamada, et al]
通讯作者: et al
12
    Non-Thermal-Equilibrium Solid-Phase Crystallization of GeSn-on-Insulator on Si Platform
    • 批准号:
      25289089
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $11.07万
    • 财政年份:
      2013
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      MIYAO Masanobu
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    • 批准号:
      24656209
    • 项目类别:
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    • 资助金额:
      $2.58万
    • 财政年份:
      2012
    • 负责人:
      MIYAO Masanobu
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    • 批准号:
      21656005
    • 项目类别:
      Grant-in-Aid for Challenging Exploratory Research
    • 资助金额:
      $2.18万
    • 财政年份:
      2009
    • 负责人:
      MIYAO Masanobu
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    High-Quality Formation of SiGe on Flexible Substrates for Transistor Application
    • 批准号:
      19360011
    • 项目类别:
      Grant-in-Aid for Scientific Research (B)
    • 资助金额:
      $11.81万
    • 财政年份:
      2007
    • 负责人:
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