Atomically-control of halfmetal/Si interface for spin-transistors
Atomically-control of halfmetal/Si interface for spin-transistors
批准号:
22360127
负责人:
MIYAO Masanobu
金额:
$11.9万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (B)
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2012
中文摘要
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英文摘要
To achieve Si-based spin-transistors, a new epitaxial growth technique of half-metal on Si has been developed. Moreover, by optimizing the electrical transport properties at half-metal/Si interfaces, injection of spin-polarized electrons has been realized at room temperature.
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HEPESによるFe3Si/Geヘテロ構造の評価
通过 HEPES 评估 Fe3Si/Ge 异质结构
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[I. Yamamoto, M. Nakano, T. Yanai, H. Fukunaga, 松本宏哉]
通讯作者:
松本宏哉
DOI:
10.1063/1.3368701
发表时间:
2010-04
期刊:
Applied Physics Letters
影响因子:
4
作者:
[K. Yamane;K. Hamaya;Y. Ando;Y. Enomoto;Keisuke Yamamoto;T. Sadoh;M. Miyao]
通讯作者:
K. Yamane;K. Hamaya;Y. Ando;Y. Enomoto;Keisuke Yamamoto;T. Sadoh;M. Miyao
(Invited) Hybrid- Formation of Ge-on-Insulator Structures on Si Platform by SiGe-Mixing-Triggered Rapid-Melting Growth --- A Road to Artificial Crystal ---
(特邀)SiGe混合触发快速熔融生长在Si平台上混合形成Ge绝缘体结构——人造晶体之路——
DOI:
10.1149/05005.0059ecst
发表时间:
2013
期刊:
ECS Transactions
影响因子:
--
作者:
[M. Miyao, M. Kurosawa, K. Toko, Y. Tojo, and T. Sadoh]
通讯作者:
and T. Sadoh
Low-temperature grown quaternary Heusler compound Co_2Mn_<1-x>Fe_xSi films on Ge(111)
Ge(111)上低温生长四元Heusler化合物Co_2Mn_<1-x>Fe_xSi薄膜
DOI:
--
发表时间:
2011
期刊:
Journal of Applied Physics
影响因子:
3.2
作者:
[S.Yamada, et al]
通讯作者:
et al
Recent Progress of Rapid-Melting-Growth for Laterally-Graded, Ge-Based Mixed-Crystals on Insurator
绝缘体上横向梯度Ge基混晶的快速熔融生长研究进展
DOI:
--
发表时间:
2013
期刊:
影响因子:
--
作者:
[E. Itoh, Y. Maruyama, and K. Fukuda, T. Sadoh]
通讯作者:
T. Sadoh
共 12 条
Non-Thermal-Equilibrium Solid-Phase Crystallization of GeSn-on-Insulator on Si Platform
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批准号:25289089
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$11.07万
-
财政年份:2013
-
负责人:MIYAO Masanobu
-
依托单位:
Development of Hetero-Materials Integration Technology for Multi-Functional Hybrid Large-Scale Integrated Circuits
-
批准号:24656209
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项目类别:Grant-in-Aid for Challenging Exploratory Research
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资助金额:$2.58万
-
财政年份:2012
-
负责人:MIYAO Masanobu
-
依托单位:
Development of spin-function on flexible semiconductors
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批准号:21656005
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项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.18万
-
财政年份:2009
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负责人:MIYAO Masanobu
-
依托单位:
High-Quality Formation of SiGe on Flexible Substrates for Transistor Application
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批准号:19360011
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$11.81万
-
财政年份:2007
-
负责人:MIYAO Masanobu
-
依托单位:
Growth of Ferromagnetic Silicide for Source/Drain Engineering
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批准号:18063018
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$34.3万
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财政年份:2006
-
负责人:MIYAO Masanobu
-
依托单位:
Low-temperature orientation-control of SiGe quasi-single crystal on glass and its device application
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批准号:15360169
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$8.19万
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财政年份:2003
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负责人:MIYAO Masanobu
-
依托单位:
Formation of Si Quasi-Single Crystal by Controlled Excess Vacancy
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批准号:12450015
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项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$9.47万
-
财政年份:2000
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负责人:MIYAO Masanobu
-
依托单位: