Photoelectron emission of MgO Thin Films with Co NanoparticlesDeposited Using Arc Plasma Gun

利用电弧等离子体枪（APG）在衬底上以岛状沉积钴纳米颗粒。然后，通过金属有机分解（MOD）在该衬底上形成MgO薄膜，使其能够在大气中形成薄膜，从而产生双层结构。在500脉冲电弧放电的APG下，沉积在Co纳米颗粒上的MgO薄膜的结晶度得到了改善，光电子发射强度至少是没有Co纳米颗粒的MgO薄膜的3倍。在Si衬底上以500次脉冲电弧放电沉积Co纳米粒子，其透射率为30%或更低，但在衬底上形成MgO薄膜后，经过900℃热处理，Co纳米粒子分散在MgO薄膜内，其透射率提高到90%以上。因此，获得了一种高透明的薄膜。

Co nanoparticles were deposited on a substrate in an island pattern using an arc plasma gun (APG). Then, a MgO thin film was formed on this substrate by metal organic decomposition (MOD), which enables the formation of films in atmosphere, thus yielding a double-layer structure. The MgO thin film on Co nanoparticles deposited using the APG with 500 pulses of arc discharge exhibited improved crystallinity and a photoelectron emission that was at least threefold higher than that of the MgO thin film without Co nanoparticles. Although the transmittance of the specimen, formed by depositing Co nanoparticles on a Si substrate with 500 pulses of arc discharge, was 30% or lower, it increased to higher than 90% after the formation of a MgO thin film on the substrate and the dispersion of the Co nanoparticles within the MgO thin film during heat treatment at 900 °C. Thus, a highly transparent film was obtained.