Toward room temperature operation of Si single-dopant devices by P and B codoping techniques
Toward room temperature operation of Si single-dopant devices by P and B codoping techniques
批准号:
22656082
负责人:
TABE Michiharu
金额:
$2.34万
依托单位:
依托单位国家:
日本
项目类别:
Grant-in-Aid for Challenging Exploratory Research
财政年份:
2010
资助国家:
日本
项目状态:
已结题
起止时间:
2010 至 2011
中文摘要
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英文摘要
In this work, the following results have been obtained. When the size of Si channel is within the order of nanometers, P donor has larger ionization energy than its value in Si bulk. Then, it is shown that the energy depth of quantum well for electrons can be further deepened, as a result of appropriate configuration of B and P atoms.
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Atom devices based on single dopants in silicon nanostructures.
基于硅纳米结构中的单个掺杂剂的原子设备。
DOI:
10.1186/1556-276x-6-479
发表时间:
2011-07-29
期刊:
Nanoscale research letters
影响因子:
--
作者:
[Moraru D, Udhiarto A, Anwar M, Nowak R, Jablonski R, Hamid E, Tarido JC, Mizuno T, Tabe M]
通讯作者:
Tabe M
Single-electron charging in phosphorous donors in silicon observed by low-temperature Kelvin probe force microscope
低温开尔文探针力显微镜观察硅中磷供体的单电子充电
DOI:
--
发表时间:
2011
期刊:
Si-based single-dopant atom devices
影响因子:
--
作者:
[M. Anwar, Y. Kawai, D. Moraru, R. Nowak, R. Jablonski, T. Mizuno, and M. Tabe]
通讯作者:
and M. Tabe
Si-based single-dopant atom devices, Advanced Materials Research
硅基单掺杂原子器件,先进材料研究
DOI:
--
发表时间:
2011
期刊:
Si-based single-dopant atom devices
影响因子:
--
作者:
[M. Tabe, D. Moraru, A. Udhiarto, S. Miki, M. Anwar, Y. Kawai and T. Mizuno]
通讯作者:
Y. Kawai and T. Mizuno
Electronic potential of lateral nanoscale Si pn junctions observed by KFM technique
KFM技术观察横向纳米级Si pn结的电子势
DOI:
--
发表时间:
2012
期刊:
影响因子:
--
作者:
[湯川博喜, 廣瀬浩次, 吉村武, 芦田淳, 藤村紀文, R. Nowak]
通讯作者:
R. Nowak
シリコンナノ構造を用いたドーパント原子デバイスとフォトン検出
使用硅纳米结构的掺杂原子装置和光子检测
DOI:
--
发表时间:
2011
期刊:
影响因子:
--
作者:
[H.Yamada, T.Fukushima, S.Sakamoto, K.Masuko, T.Yoshimura, N.Fujunura, D.Moraru, 田部道晴]
通讯作者:
田部道晴
共 81 条
Dopant-atom-controlled tunnel diodes using Si nano-pn junctions
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批准号:25630144
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项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.58万
-
财政年份:2013
-
负责人:TABE Michiharu
-
依托单位:
Si single-electron transfer devices using potential fluctuation by a few dopants
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批准号:20246060
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项目类别:Grant-in-Aid for Scientific Research (A)
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资助金额:$28.87万
-
财政年份:2008
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负责人:TABE Michiharu
-
依托单位:
Nanoscale-multiple-junctions : Transport control and development of new functions
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批准号:18063010
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项目类别:Grant-in-Aid for Scientific Research on Priority Areas
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资助金额:$30.46万
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财政年份:2006
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负责人:TABE Michiharu
-
依托单位:
Silicon single-electron devices : Time-space control of transport and development of new functions
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批准号:16106006
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项目类别:Grant-in-Aid for Scientific Research (S)
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资助金额:$61.82万
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财政年份:2004
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负责人:TABE Michiharu
-
依托单位:
Development of thermally-stable structures of thin SOI active layers
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批准号:12555087
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.27万
-
财政年份:2000
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负责人:TABE Michiharu
-
依托单位:
Fabrication and electron transport properties of two-dimensionally-coupled dots of single crystalline Si
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批准号:12450125
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$6.98万
-
财政年份:2000
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负责人:TABE Michiharu
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依托单位:
ULTRA-SMALL LOCOS PROCESS FOR Si QUANTUM DOT FORMATION
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批准号:07455137
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项目类别:Grant-in-Aid for Scientific Research (B)
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资助金额:$2.37万
-
财政年份:1995
-
负责人:TABE Michiharu
-
依托单位:
海外基金