Development of equipment for multi-purpose materials processing by ions produced in high-density pulsed discharge plasmas
Development of equipment for multi-purpose materials processing by ions produced in high-density pulsed discharge plasmas
批准号:
26420230
负责人:
KIMURA Takashi
金额:
$3.16万
依托单位国家:
日本
项目类别:
Grant-in-Aid for Scientific Research (C)
财政年份:
2014
资助国家:
日本
项目状态:
已结题
起止时间:
2014-04-01 至 2017-03-31
中文摘要
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DOI:
10.7567/jjap.55.07le02
发表时间:
2016-06
期刊:
Japanese Journal of Applied Physics
影响因子:
1.5
作者:
[T. Kimura;H. Kamata]
通讯作者:
T. Kimura;H. Kamata
DOI:
10.1016/j.surfcoat.2016.07.030
发表时间:
2016-12
期刊:
Surface & Coatings Technology
影响因子:
5.4
作者:
[T. Kimura;T. Mishima;K. Azuma;S. Nakao]
通讯作者:
T. Kimura;T. Mishima;K. Azuma;S. Nakao
Preparation of hydrogenated diamond-like carbon films by reactive Ar/CH4 high power impulse magnetron sputtering with negative pulse voltage
负脉冲电压反应Ar/CH4高功率脉冲磁控溅射制备氢化类金刚石碳薄膜
DOI:
--
发表时间:
2015
期刊:
影响因子:
--
作者:
[鎌田 光速, 木村 高志, 中尾 節男, 東 欣吾, 原田 敏和,七森 公碩,梅上 大勝,山本 真義, Takashi Kimura,Hikaru Kamata]
通讯作者:
Takashi Kimura,Hikaru Kamata
ホロ-形状ターゲットを持つ高電力パルススパッタの電気特性
空心靶高功率脉冲溅射电学特性
DOI:
--
发表时间:
2017
期刊:
影响因子:
--
作者:
[Hiroki Ishibashi, Akihiro Nishigaki, Hirokatsu Umegami, Wilmar Martinez and Masayoshi Yamamoto, 吉田 尭,石橋 寛基,山本 真義, 木村高志,三島俊彦]
通讯作者:
木村高志,三島俊彦
Properties of amorphous carbon films prepared by high power pulsed sputtering with two facing targets
两靶高功率脉冲溅射制备非晶碳薄膜的性能
DOI:
--
发表时间:
2015
期刊:
影响因子:
--
作者:
[Takashi Kimura, Toshihiko Mishima, Kingo Azuma, Setsuo Nakao]
通讯作者:
Setsuo Nakao
共 11 条
Preparation of functional hard coating materials by high density pulsed plasma ion implantation
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批准号:17K06298
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$3.08万
-
财政年份:2017
-
负责人:KIMURA Takashi
-
依托单位:
Innovative multiple-bit information writing using local pure spin current injection
-
批准号:23651150
-
项目类别:Grant-in-Aid for Challenging Exploratory Research
-
资助金额:$2.41万
-
财政年份:2011
-
负责人:KIMURA Takashi
-
依托单位:
Development of hard deformable focusing mirror for general-purpose hard X-ray optics.
-
批准号:23860001
-
项目类别:Grant-in-Aid for Research Activity Start-up
-
资助金额:$1.83万
-
财政年份:2011
-
负责人:KIMURA Takashi
-
依托单位:
Development of efficient magnetic refrigeration technique using pure spin current
-
批准号:22246003
-
项目类别:Grant-in-Aid for Scientific Research (A)
-
资助金额:$26.54万
-
财政年份:2010
-
负责人:KIMURA Takashi
-
依托单位:
Functional analysis of equine herpesvirus-1 receptor and its application for infection prevention
-
批准号:20380165
-
项目类别:Grant-in-Aid for Scientific Research (B)
-
资助金额:$11.4万
-
财政年份:2008
-
负责人:KIMURA Takashi
-
依托单位:
Development of plasma process equipment with pulsed plasma ablation technique
-
批准号:20560267
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.91万
-
财政年份:2008
-
负责人:KIMURA Takashi
-
依托单位:
Development of multi-terminal spin logic devices using lateral spin injection devices
-
批准号:19686002
-
项目类别:Grant-in-Aid for Young Scientists (A)
-
资助金额:$13.98万
-
财政年份:2007
-
负责人:KIMURA Takashi
-
依托单位:
Superfluid States and Mott Transitions of Neutral Atom Systems
-
批准号:18740251
-
项目类别:Grant-in-Aid for Young Scientists (B)
-
资助金额:$2.53万
-
财政年份:2006
-
负责人:KIMURA Takashi
-
依托单位:
Analysis of West Nile virus neuroinvasion using in vitro blood-brain barrier models
-
批准号:18580302
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.57万
-
财政年份:2006
-
负责人:KIMURA Takashi
-
依托单位:
Study on high frequency discharge containing oxygen at atmospheric pressure
-
批准号:16560242
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$1.92万
-
财政年份:2004
-
负责人:KIMURA Takashi
-
依托单位:
Study on high concentration ozonizer using barrier discharges of rare gas -oxygen mixture
-
批准号:14550263
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$2.24万
-
财政年份:2002
-
负责人:KIMURA Takashi
-
依托单位:
Differing Reception of Aesop's Fables in Russia and Japan
-
批准号:11610577
-
项目类别:Grant-in-Aid for Scientific Research (C)
-
资助金额:$1.92万
-
财政年份:1999
-
负责人:KIMURA Takashi
-
依托单位:
海外基金