Development of plasma process equipment with pulsed plasma ablation technique

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Thin amorphous carbon films are deposited on silicon substrates by exposure to pulsed plasmas where the feed gas is mainly generated from the ablation of an insulator. An electrothermal pulsed plasma thruster is used as the pulsed plasma for the ablation of the insulator, and the material of the insulator rod is polytetrafluoroethylene (PTFE). X-ray photoelectron spectroscopy is used in order to understand the elemental compositions of the deposited films. The measured spectra show that the fraction of fluorine F1s is larger than that of carbon C1s. In Raman spectra, two, very broad overlapping bands, which are attributed to the G (graphite) and D (disorder) peaks, are clearly observed. The maximum hardness measured by a nanoindenter is about 7 GPa. Therefore, the films should be regarded as fluorinated DLC films.