Si Fin Optical Modulator for Low Power Interconnection
Si Fin Optical Modulator for Low Power Interconnection
批准号:
EP/M009416/1
负责人:
Shinichi Saito
金额:
$64.82万
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2014
资助国家:
英国
项目状态:
已结题
起止时间:
2014 至 --
中文摘要
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英文摘要
Si photonics is achieving a drastic innovation for optical networks in terms of low power, low cost, high bandwidth, and large-scale integration capabilities with smart electronics fabricated in ubiquitous infrastructures of Complementary-Metal-Oxide-Semiconductor (CMOS) foundries. Optical networks have been already introduced by using III-V compound semiconductors for long-hall communications, which require higher performance over the cost. Si photonics should not compete in this field, since the industries will not grow just by replacing these markets with Si photonics. Si Photonics is more promising in short-reach optical interconnections, which requires lower power consumption and lower fabrication costs. CMOS technologies are ideal in mass production to provide significant numbers of optical components required for short-reach communications such as backplane board-to-board, intra-board chip-to-chip, and intra-chip optical interconnections. Si optical modulators, which convert the electrical signals to the optical signals on a chip, are the most important building blocks for Si photonics. Here, we will develop the world's best low power Si modulators, which can be driven by the CMOS front-end driver circuitry. We will introduce the atomically flat Si fin technologies for the first time in optical modulators to develop the MOS-type Mach-Zehnder Interferometer (MZI) with a slot waveguide and the SiGe fin based Electro-Absorption (EA) modulators for short-reach interconnections and chip-to-chip applications, respectively. We anticipate that these devices will be widely used in data centres for cloud computing and network routing, contributing to reduce the power consumptions substantially, while increasing bandwidths. Our first target of Si fin MZI optical modulators is aiming for the near term application to C form-factor pluggable 100-Gigabit-ethernet (CFP100GE) in multi-source agreement (MSA) at the 1310-nm wavelength region. We think that this is a natural choice of technology, since we have no MSA at the wavelength of 1550-nm, and a MZI has a better technological-readiness-level over an EA modulator. For the longer term, however, a EA modulator can exceed its performance over MZI. Therefore, the other target for our SiGe fin EA modulator is the energy demanding chip-to-chip interconnection application by using the 1550-nm wavelength range, where no standardization exists at this moment. We will realize truly low power performance including a CMOS driver and laser diodes. Therefore, our project will cover both 1310-nm and 1550-nm wavelength ranges for near-term businesses and leading future technology trends.
期刊论文(10)
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Low-loss silicon rectangular waveguides fabricated by anisotoropic wet etching for roughness reduction
采用各向异性湿法刻蚀降低粗糙度的低损耗硅矩形波导
DOI:
10.1109/group4.2015.7305962
发表时间:
2015
期刊:
影响因子:
--
作者:
[Arimoto H]
通讯作者:
Arimoto H
DOI:
10.3389/fphy.2021.659585
发表时间:
2021-05
期刊:
Palaeogeography, Palaeoclimatology, Palaeoecology
影响因子:
--
作者:
[J. Byers;K. Debnath;H. Arimoto;M. Husain;M. Sotto;J. Hillier;K. Kiang;D. Thomson;G. Reed;M. Charlton;S. Saito]
通讯作者:
J. Byers;K. Debnath;H. Arimoto;M. Husain;M. Sotto;J. Hillier;K. Kiang;D. Thomson;G. Reed;M. Charlton;S. Saito
DOI:
10.3389/fmats.2015.00043
发表时间:
2015-01-01
期刊:
FRONTIERS IN MATERIALS
影响因子:
3.2
作者:
[Al-Attili, Abdelrahman Zaher, Kako, Satoshi, Saito, Shinichi]
通讯作者:
Saito, Shinichi
Silicon slot fin waveguide on bonded double-SOI for a low-power accumulation modulator fabricated by an anisotropic wet etching technique.
用于通过各向异性湿法蚀刻技术制造的低功率累积调制器的键合双 SOI 上的硅槽鳍波导。
DOI:
10.1364/oe.26.033180
发表时间:
2018
期刊:
Optics express
影响因子:
3.8
作者:
[Byers J]
通讯作者:
Byers J
Tensile strain of germanium micro-disks on freestanding SiO2 beams
独立式 SiO2 梁上的锗微盘的拉伸应变
DOI:
--
发表时间:
2015
期刊:
影响因子:
--
作者:
[A. Al-Attili]
通讯作者:
A. Al-Attili
共 7 条
Innovation by Strongly Correlated Photonic System
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批准号:18K19958
-
项目类别:Fund for the Promotion of Joint International Research (Home-Returning Researcher Development Research)
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资助金额:$39.6万
-
财政年份:2020
-
负责人:Shinichi Saito
-
依托单位:
Manufacturing Quantum Nano-LEGO Blocks for Electronics, Photonics, and Phononics Integrated Systems
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批准号:EP/M008975/1
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项目类别:Fellowship
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资助金额:$139.55万
-
财政年份:2015
-
负责人:Shinichi Saito
-
依托单位:
国内基金
海外基金
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UIS应力下高压垂直型氮化镓Fin-JFET器
件雪崩电热模型及退化机理
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批准号:
-
项目类别:省市级项目
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资助金额:10.0万元
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批准年份:2025
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负责人:赵垚澎
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依托单位:
FRMD7新突变的致病机制与基因治疗FIN的实验性研究
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批准号:2023J01312
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项目类别:省市级项目
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资助金额:9.0万元
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批准年份:2023
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负责人:阳菊华
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依托单位:
FinFET器件辐射效应Fin结构相关性及可靠性研究
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批准号:62374124
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项目类别:面上项目
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资助金额:55万元
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批准年份:2023
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负责人:曹艳荣
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依托单位:
Fin 纳米沟道调制的两端型GaN HEMT太赫兹探测器研究
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批准号:
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项目类别:省市级项目
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资助金额:--
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批准年份:2022
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负责人:
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依托单位:
GaN基Fin-HEMT器件输运特性影响机制与调控机理研究
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批准号:--
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项目类别:青年科学基金项目
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资助金额:30万元
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批准年份:2022
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负责人:朱青
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依托单位:
多沟道InAlGaN/GaN高线性增强型毫米波Fin-HEMT器件研究
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批准号:62004150
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项目类别:青年科学基金项目
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资助金额:24.0万元
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批准年份:2020
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负责人:何云龙
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依托单位: