Novel InSb quantum dots monolithically grown on silicon for low cost mid-infrared light emitting diodes
Novel InSb quantum dots monolithically grown on silicon for low cost mid-infrared light emitting diodes
批准号:
EP/N018605/1
负责人:
Peter Carrington
金额:
$12.71万
依托单位:
依托单位国家:
英国
项目类别:
Research Grant
财政年份:
2016
资助国家:
英国
项目状态:
已结题
起止时间:
2016 至 --
中文摘要
点击翻译按钮获取中文摘要
英文摘要
There is great worldwide interest in the mid-infrared spectral region (2-5 um) as it contains the fundamental absorption bands of a number of pollutant and toxic gases and liquids. These include gases such as carbon dioxide, carbon monoxide and hydrogen chloride which require accurate, in-situ multi-component monitoring in a number of industries such as oil-rigs, coal mines, land-fill sites and car exhausts. Strong absorption bands also exist for drug intermediates, pharmaceuticals, narcotics and biochemicals where the absorption strength is typically 2 orders of magnitude stronger than in the near-infrared allowing highly selective and sensitive detection in the fields of: environmental monitoring, bio-medicine, industrial process control and health and safety. There is also an atmospheric transmission window between 3.6 and 3.8 um which enables free space optical communication and thermal imaging in both civil and military situations as well as the development of infrared countermeasures for homeland security. However, these applications have yet to be fully exploited due to the lack of efficient and affordable light sources and detectors. This work proposes the growth and fabrication of a new light emitting diode (LED) architecture based on indium antimonide (InSb) quantum dots onto low cost silicon (Si) substrates. This will revolutionize how we utilize these devices and lead to a dramatic scaling in the cost and size of the optical systems to enable their widespread uptake. It will also enable the photonic components to be directly embedded into electronic circuits which would open up a new field of mid-infrared photonic integrated circuits. This would generate entirely new technology in areas such as integrated 'lab-on-a-chip' sensors and compact biochips bringing great commercial benefits and opportunities to the UK.In the last few years, there has been significant progress in the development of mid-infrared devices using interband cascade lasers and type II superlattices. However these structures are extremely complex and expensive to fabricate and are grown on gallium antimonide (GaSb) substrates which are of poor quality, high cost (~50 times the cost of Si) and are only available in small sizes. Growth onto silicon would be most desireable to enable cost effective manufacture and to ensure future commercial success. The major obstacle in direct epitaxial growth of III-Vs onto Si is the large lattice mismatch between the III-V/Si interface, resulting in a large density of threading dislocations (TDs) which strongly deteriorate the device performance. This project shall overcome this by implementation of a new device design based on InSb quantum dots on low defect density GaSb buffer layers grown on Si. The key advantages are the mechanical robustness and very low sensitivity of the quantum dots to TD compared to bulk or quantum well structures, and the suppression of non-radiative Auger recombination to increase the quantum efficiency. In a quantum well device, every threading dislocation which propagates through it will act as a non-radiative centre drastically reducing the device performance. However in a QD, each TD will only 'kill' one or a few isolated dots which will not significantly affect device performance providing the TD density in the buffer layer can be reduced to moderate-to-low levels. Low defect density GaSb buffer layers shall be realized through novel 'interfacial misfit arrays (IMF)' and dislocation filtering layers designed to bend and annihilate TD generated at the III-V/Si interface. The Si based mid-infrared LEDs will be developed in close collaboration with academic (University of Southampton and University of Montpellier) and industrial (Compound Semiconductor Technologies and Gas Sensing Solutions) project partners to evaluate device performance for use in practical applications which will help to achieve future commercialisation.
期刊论文(9)
专著(0)
科研奖励(0)
会议论文
登录
查看更多内容
ULTRARAM: A Low-Energy, High-Endurance, Compound-Semiconductor Memory on Silicon
ULTRARAM:低能耗、高耐用性、硅基复合半导体存储器
DOI:
10.1002/aelm.202101103
发表时间:
2022
期刊:
Advanced Electronic Materials
影响因子:
6.2
作者:
[Hodgson P]
通讯作者:
Hodgson P
DOI:
10.1109/jphot.2019.2911433
发表时间:
2019-04
期刊:
IEEE Photonics Journal
影响因子:
2.4
作者:
[E. Delli;P. Hodgson;E. Repiso;A. Craig;Jonathan P. Hayton;Q. Lu;A. Marshall;A. Krier;P. Carrington]
通讯作者:
E. Delli;P. Hodgson;E. Repiso;A. Craig;Jonathan P. Hayton;Q. Lu;A. Marshall;A. Krier;P. Carrington
Optical and structural properties of InGaSb/GaAs quantum dots grown by molecular beam epitaxy
分子束外延生长的InGaSb/GaAs量子点的光学和结构特性
DOI:
10.1088/1361-6641/aae627
发表时间:
2018
期刊:
Semiconductor Science and Technology
影响因子:
1.9
作者:
[Hodgson P]
通讯作者:
Hodgson P
Antimony based mid-infrared semiconductor materials and devices monolithically grown on silicon substrates
在硅衬底上单片生长的锑基中红外半导体材料和器件
DOI:
10.1109/ipcon.2017.8116118
发表时间:
2017
期刊:
影响因子:
--
作者:
[Carrington P]
通讯作者:
Carrington P
Electroluminescence characterization of mid-infrared InAsSb/AlInAs multi-quantum well light emitting diodes heteroepitaxially integrated on GaAs and silicon wafers
异质外延集成在 GaAs 和硅片上的中红外 InAsSb/AlInAs 多量子阱发光二极管的电致发光表征
DOI:
10.1016/j.jcrysgro.2022.126627
发表时间:
2022
期刊:
Journal of Crystal Growth
影响因子:
1.8
作者:
[Altayar A]
通讯作者:
Altayar A
共 8 条
国内基金
海外基金
登录
查看更多内容
Ba固溶、碱金属掺杂和纳米InSb原位复合协同优化p型Mg3Sb2热电性能研究
-
批准号:
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2023
-
负责人:
-
依托单位:
InSb量子点结构可控合成及红外光催化产氢性能研究
-
批准号:22302181
-
项目类别:青年科学基金项目
-
资助金额:30万元
-
批准年份:2023
-
负责人:曾斌
-
依托单位:
有机分子共混InSb量子点的光电探测器制备及器件物理研究
-
批准号:--
-
项目类别:青年科学基金项目
-
资助金额:30万元
-
批准年份:2022
-
负责人:李京周
-
依托单位:
Bi掺杂和InSb复合对p型Mg3Sb2的热电功率因子的优化研究
-
批准号:
-
项目类别:省市级项目
-
资助金额:--
-
批准年份:2020
-
负责人:
-
依托单位:
基于原位反应的InSb化合物的微结构调控和电热输运性能研究
-
批准号:51872102
-
项目类别:面上项目
-
资助金额:60.0万元
-
批准年份:2018
-
负责人:杨君友
-
依托单位:
窄禁带半导体InSb低维纳米结构中的自旋调控
-
批准号:11674312
-
项目类别:面上项目
-
资助金额:71.0万元
-
批准年份:2016
-
负责人:王晓蕾
-
依托单位:
垂直InAs和InSb纳米线阵列的可控生长及应用特性研究
-
批准号:U1404619
-
项目类别:联合基金项目
-
资助金额:30.0万元
-
批准年份:2014
-
负责人:李天锋
-
依托单位:
高质量InSb纳米线的分子束外延生长,微结构及输运特性研究
-
批准号:61376015
-
项目类别:面上项目
-
资助金额:86.0万元
-
批准年份:2013
-
负责人:陈平平
-
依托单位:
原位集成电荷探测器的InSb纳米线耦合双量子点的实验构筑及低温电学输运研究
-
批准号:11274021
-
项目类别:面上项目
-
资助金额:90.0万元
-
批准年份:2012
-
负责人:黄少云
-
依托单位:
InSb/Sb超晶格纳米线阵列制备与电输运性能研究
-
批准号:10847115
-
项目类别:专项基金项目
-
资助金额:2.0万元
-
批准年份:2008
-
负责人:杨友文
-
依托单位: