IMPLANTABLE STIMULATING MICROELECTRODES
IMPLANTABLE STIMULATING MICROELECTRODES
批准号:
3509104
负责人:
SRINIVASAN SARANGAPANI
金额:
$26.19万
依托单位:
依托单位国家:
美国
项目类别:
财政年份:
1984
资助国家:
美国
项目状态:
已结题
起止时间:
1984-06-15 至 1990-06-30
中文摘要
随着神经刺激电极的发展,越来越多
英文摘要
As the development of neural stimulating electrodes is progressing, more
attention has been directed towards studying possible adverse side effects
attendant to their use. This is especially true for applications which
require chronic stimulation at high current densities. The risk of tissue
damage, which is generally believed to be associated with the toxic species
formed electrochemically at the electrode tissue interface, has been a
concern in neural stimulation. The objective of this proposed program is
to develop high surface area "double layer" type inert electrodes suitable
for the electrical stimulation of neural elements and thus to contribute to
the development of electrical devices for treatment of various neurological
disorders. In the Phase I of this program, we prepared and characterized
high surface area gold microelectrodes which delivered a charge density of
1 mC/cm2/phase. Further studies are proposed here to improve the
performance of these gold electrodes and to develop similar electrodes from
other compatible materials. Both long term in vitro and in vivo studies
will be carried out and performance of these electrodes will be assessed.
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