Investigation of advanced plasma sources for materials processing and for device fabrication

研究用于材料加工和设备制造的先进等离子体源

• 批准号: 38124-2009
• 负责人: Chaker, Mohamed
• 金额: $ 5.03万
• 依托单位: Institut national de la recherche scientifique
• 依托单位国家: 加拿大
• 项目类别: Discovery Grants Program - Individual
• 财政年份: 2012
• 资助国家: 加拿大
• 起止时间: 2012-01-01 至 2013-12-31
• 项目状态: 已结题
• 来源: https://www.nserc-crsng.gc.ca/ase-oro/Details-Detailles_eng.asp?id=513437
• 关键词: Investigation; advanced; plasma; sources; materials

For many years, I have been leading an interdisciplinary program on advanced plasma sources for thin film processing. From the very beginning, it has been built on a deep knowledge of plasma science and on an exhaustive know-how in materials processing (synthesis and etching) and characterization. I intend to capitalize on my previously successful work and continue to excel in combining plasma and materials science and technology for the conception of innovative materials processing and for the fabrication of advanced RF and photonic components.

多年来，我一直在领导一个关于用于薄膜加工的先进等离子体源的跨学科项目。从一开始，它就建立在深厚的等离子体科学知识和材料加工(合成和蚀刻)和表征方面的详尽技术之上。我打算利用我以前成功的工作，继续在等离子体和材料科学与技术的结合、创新材料加工的概念以及先进的射频和光子组件的制造方面表现出色。