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Standard NbN and NbTiN films prepared by nitrogen implantation for process characterization and optimization

Standard NbN and NbTiN films prepared by nitrogen implantation for process characterization and optimization
通过氮注入制备标准 NbN 和 NbTiN 薄膜,用于工艺表征和优化
批准号:
521752-2017
负责人:
Rosei, Federico
金额:
$1.82万
依托单位国家:
加拿大
项目类别:
Engage Grants Program
财政年份:
2017
资助国家:
加拿大
项目状态:
已结题
起止时间:
2017-01-01 至 2018-12-31

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中文摘要
翻译
这个为期六个月的项目旨在通过氮离子注入在蓝宝石衬底上获得100-200 nm厚度的标准NbN和NbTiN薄膜,并将其物理性能与溅射沉积的类似薄膜进行比较,以进行质量控制和工艺优化。这些功能解决了Angstrom工程公司的一个至关重要的问题,我们的工业合作伙伴,开发先进的沉积系统,并为基础和应用研究实施制造工艺,涉及传感技术,电子器件和纳米材料工程。该公司将提供纯沉积的Nb和NbTi薄膜,这些薄膜将通过N+离子注入并在INRS退火,以及使用Angstrom的商业仪器在不同沉积参数下合成的NbN和NbTiN样品。注入氮离子的能量和剂量将被设置为能够在不同样品之间进行相关比较,使用由先进表征工具支持的蒙特-卡罗模拟,例如SE、SEM、EDX、拉曼和XRD分析。然后在低温下研究了用溅射沉积和离子注入方法制备的NbN和NbTiN薄膜,测量了它们的电阻率和临界温度。我们的研究将主要在蒙特利尔地区进行,那里有离子注入和先进表征的设施。为了实现我们的目标,包括处理几个离子注入原型,供公司用作参考样品,并扩大Angstrom科学工作人员的专业知识和专业知识,Rosei教授将在整个项目期间得到一名研究助理的协助。预期的影响将导致对铌基纳米薄膜及其合成的知识的进步,用于非破坏性计量学,先进制造和材料工程领域的未来工作。
英文摘要
This six month project aims to achieve standard NbN and NbTiN thin films of 100-200 nm thickness onsapphire substrates using nitrogen ion implantation, and compare their physical properties to similar filmsprepared by sputter deposition for quality control and process optimization. These features address a problemof critical importance for Angstrom Engineering Inc., our industrial partner, who develops advanced depositionsystems and implements fabrication processes for basic and applied research, related to sensing technology,superconductive electronic devices and nanomaterials engineering. The company will provide pure depositedNb and NbTi films that will be implanted by N+ ion and annealed at INRS, as well as NbN and NbTiNsamples synthesized under different deposition parameters using Angstrom's commercial instruments. Theenergy and dose of implanted nitrogen ions will be set to enable a relevant comparison between the differentsamples, using Monte-Carlo simulations supported by advanced characterization tools, such as SE, SEM, EDX,Raman, and XRD analyses. Both NbN and NbTiN films prepared by sputter deposition and processed by ionimplantation will be then investigated at low-temperatures, to measurement their electrical resistivity andcritical temperatures. Our research will be mainly conducted in the Montréal Area, where facilities for ionimplantation and advanced characterization are available. To achieve our objectives, which include theprocessing of several ion-implanted prototypes to be used as reference specimens by the company and extendboth the know-how and the expertise of Angstrom's scientific staff, Prof. Rosei will be assisted by a researchassociate during the whole duration of the project. The expected impact will result in advancing knowledge onNb-based superconductive films and their synthesis, for future work in the areas of non-destructive metrology,advanced manufacturing and materials engineering.
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