Particles in rf Plasma Processing Discharges: Generation, Transport and Plasma Dynamics

辉光放电射频放电用于等离子体材料加工，不可避免地会受到颗粒物的污染。这些颗粒，或称“尘埃”，是由表面的气相成核、聚合或溅射产生的。在一个极端情况下，在受污染的等离子体中制造的微电子设备和薄膜的成品率很低。然而，颗粒也是故意在放电中产生的，用于制备非相固体的起始材料。粒子的产生、传输和对等离子体动力学的影响在很大程度上是未知的。我们建议计算研究导致粒子形成的条件，粒子对射频放电特性的影响，以及来自等离子体的粒子如何污染表面。在这样做的同时，我们还将研究在纳米晶体的合成中故意增强颗粒形成的方法。等离子体工艺制备的微电子设备成品率降低的最大原因是颗粒污染。因此，了解粒子的产生、输运方式及其对等离子体参数的影响，将对微电子制造和特种粉末行业产生重要影响。

Glow discharge radio frequency (rf) discharges, as used for plasma materials processing, are inevitably contamined by particulate matter. These particles, or "dust", result from gas phase nucleation, polymerization or sputtering of surfaces. At one extreme, the yield of microelectronic devices and thin films fabricated in contamined plasmas are known to be poor. Particles, however, are also intentionally produced in discharges for starting materials to fabricate nonphase solids. The methods of generation, transport and the effects of particles on plasma dynamics are largely unknown. We propose to computationally investigate the conditions with lead to formation of particles, the effects of particles on the characteristics of rf discharges, and how particles from the plasma contaminate surfaces. In doing so, we will also investigate methods whereby the formation of particles can be intentionally enhanced as in the synthesis of nanocrystals. The single greatest cause of reduced yields of microelectronic devices prepared by plasma processing is particle contamination. Therefore, understanding the method of generation, transport and effects on plasma parameters of particles will have an important impact on microelectronics fabrication and the specialty powders industries.