Surface Reactivity of Radicals During Plasma Deposition of Thin Films

小行星9409272 这项研究计划的长期目标是了解低温等离子体的化学性质。 为了使等离子体技术进一步发展，必须对所涉及的基本化学过程有扎实的理解，以补充经验知识。我们将使用IRIS（与表面相互作用的自由基成像）技术，结合空间分辨的激光诱导荧光与等离子体分子束，确定在沉积膜的表面等离子体自由基的反应性。 我们将研究等离子体沉积薄膜以及等离子体环境，产生所需质量的薄膜。几种分析方法将用于表征等离子体环境和沉积膜。 这些包括光学发射光谱（OES），激光诱导荧光和等离子体中的光散射。 等离子体具有许多工业应用，包括薄膜沉积和蚀刻、表面改性和聚合物合成。等离子体沉积特别适用于薄膜的生产，并且还为材料提供了环境清洁的途径。 这项工作的主要目的是建立等离子体环境，有利于生产特定的薄膜质量或等离子体物种。 这项研究将有助于提高用于计算，信息处理和电信的先进器件和集成电路的一般性能。 ***

9409272 Fisher The long-range goal of this research program is to gain understanding of the chemistry of low-temperature plasmas. For further progress in plasma technology to occur, it is imperative to supplement empirical knowledge with solid understanding of the basic chemical processes involved. We will determine the reactivity of plasma radicals at the surface of depositing films using the IRIS (Imaging of Radicals Interacting with Surfaces) technique that combines spatially-resolved laser-induced fluorescence with plasma molecular beams. We will examine plasma deposited thin films as well as plasma environments that produce films with desired qualities. Several analytical methods will be used to characterize plasma environments and deposited films. These include optical emission spectroscopy (OES), laser-induced fluorescence, and light-scattering in the plasmas. %%% Plasmas have many industrial applications, including thin film deposition and etching, surface modification, and polymer synthesis. Plasma deposition is particularly versatile for production of thin films and also provides environmentally-clean routes to materials. A primary aim of this work is to establish plasma environments conducive to production of particular film qualities or plasma species. This research will contribute to improving the general performance of advanced devices and integrated circuits used in computing, information processing, and telecommunications. ***