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Femtosecond Pulsed Laser-Assisted Ultrafine Machining of Chemical Vapor Deposited Diamond Films

Femtosecond Pulsed Laser-Assisted Ultrafine Machining of Chemical Vapor Deposited Diamond Films
飞秒脉冲激光辅助化学气相沉积金刚石薄膜超精细加工
批准号:
9622518
负责人:
Ajay Malshe
金额:
$25.0万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
1996
资助国家:
美国
项目状态:
已结题
起止时间:
1996-09-15 至 1999-08-31

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中文摘要
翻译
DMI-9622518马尔什化学气相沉积(CVD)金刚石沉积提高了电子、光学、计算机和机械行业许多现有技术系统的运行性能。以前,离子、磨料和化学物质等能源被认为是用于CVD-金刚石薄膜的后合成精加工和加工。这些技术不可避免地会导致表面和次表层的污染和损坏,如残余应力、化学物质残留和缺陷。这些技术中的许多都是基于直接在衬底上应用固体、液体或气体抛光。这些技术的结果是缓慢的,从而导致损坏和恶化。本研究开发和研究了一种新型的飞秒脉冲激光加工技术,用于CVD金刚石薄膜和其他CVD金刚石基元件的超细加工。研究人员提出,将紫外线(UV)波长、脉冲宽度和加工环境与这种新方法恰当地结合起来,不仅将改进现有的激光加工技术,而且在物理化学加工性能上将超过所有其他现有的加工技术。这项研究任务是与爱荷华州立大学合作进行的。
英文摘要
DMI-9622518 Malshe Chemical Vapor Deposited (CVD) diamond deposition has enhanced the operating performance of many existing technological systems for the electronics, optical, computer and mechanical industries. Previously, energy sources such as ions, abrasive, and chemical was considered for post-synthesis finishing and machining of CVD-diamond films. These techniques inevitably lead to contamination and damage to the surfaces and subsurface layers as residual stresses, chemicals residues, and defects. Many of these techniques were based on applying a solid, liquid, or gas polish directly on the substrate. The results of these techniques are slow, thereby resulting in damage and deterioration. This research develops and investigates a novel femtosecond (fs) pulse laser processing technique for ultrafine machining of CVD-diamond films and other CVD-diamond based components. The investigators proposes that the right combination of ultraviolet (UV) wavelength, pulse width, and processing environment with this novel approach will not only refine existing laser-processing techniques, but also surpass all other existing processing techniques in their physico-chemical machining performances. The research task is in collaboration with the Iowa State University.
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