Simulation of 3-dimensional Transport and Transients in Plasma Processing Reactors Using Moderate Parallelism

在本项目中，开发了三维等离子体设备模型（PEMs）来研究具有工业意义的等离子体处理反应器中的化学、物理和工程缩放问题。这些模型建立在一个集成的混合仿真层次结构上，其中等离子体表面相互作用模型与等离子体表面相互作用模型相关联。为研究瞬态等离子体过程，开发了三维电子和离子输运、鞘层结构和等离子体表面相互作用的新算法。采用适度并行（2-10个处理器）的计算机，以便处理具有不同时间尺度的现象的瞬态或实时连接。研究了具有旋转磁场的反应器，如磁增强反应离子蚀刻（MERIE）和电离金属物理气相沉积（IMPVD）反应器，螺旋反应器中的波等离子体现象，以及电感耦合等离子体（ICP）反应器等“传统”反应器中的瞬态（启动、关闭、配方变化）。目的是评估三维等离子体传输对蚀刻或沉积的均匀性和质量的影响，并生成缩放规律，将这些评估转移到其他系统

AbstractKushner, Mark J.CTS-9974962U of ILL Urbana-Champaign In this project, three-dimensional plasma equipment models (PEMs) are developed to investigate chemical, physical, and engineering scaling issues in plasma-processing reactors of industrial interest. These models build upon an integrated hybrid simulation hierarchy in which PEMs are linked with plasma-surface interaction models. New algorithms for 3-d electron and ion transport, sheath structure, and plasma-surface interactions are developed for investigation of transient plasma processes. Moderately parallel (2-10 processors) computers are employed so that transient or real-time linking of phenomena having disparate timescales can be addressed. Reactors with rotating magnetic fields, such as magnetically enhanced reactive ion etching (MERIE) and ionized metal physical vapor deposition (IMPVD) reactors, wave-plasma phenomena in helicon reactors, and transients (startup, shutdown, recipe changes) in "conventional" reactors like inductively coupled plasma (ICP) reactors are investigated. The objectives are to assess the impact of 3-d plasma transport on the uniformity and quality of the etch or deposition and to generate scaling laws to transfer these assessments to other systems