Ligand Control in CVD of Nanostructured Materials

该奖项授予明尼苏达大学双城分校的Wayne Gladfelter教授，是早期奖项的更新，由化学部门的先进材料和加工项目以及材料研究部门的电子材料项目提供支持。本研究的重点是研究无水金属硝酸盐化学气相沉积单金属和多金属氧化膜的方法。该奖项还将评估配体控制沉积过程的动力学和微观结构机制，并研究确定沉积机制之间的关系。该奖项的另一个组成部分是研究多组分氧化物的原子层化学气相沉积。此外，该研究将为学生提供材料化学重要跨学科领域的培训。该奖项将研究配体控制沉积过程的动力学和微观结构机制，并研究确定化学气相沉积过程中沉积机理与膜成分之间的关系。本项目将通过化学气相沉积和原子层化学气相沉积制备各种金属氧化物薄膜，这些非晶高介电材料可用于制备具有可调谐电子和光子特性的薄膜。此外，该研究项目将为材料化学专业的学生提供丰富的多学科教育和培训机会。

This award to Professor Wayne Gladfelter of the University of Minnesota-Twin Cities is a renewal of an earlier award and is supported by the Advanced Materials and Processing Program in the Chemistry Division and the Electronic Materials Program in the Division of Materials Research. The focus of the research will be to study the chemical vapor deposition of mono- and multimetal oxide films from anhydrous metal nitrates. The award also will evaluate the ligand controlled kinetics and microstructure mechanism of the deposition processes, and studies to determine relationship between the deposition mechanism. Another component of the award is the study of atomic layer chemical vapor deposition of multicomponent oxide. In addition, the research will provide training to students in an important interdisciplinary area of materials chemistry.This award will study the ligand controlled kinetics and microstructure mechanism of the deposition processes, and studies to determine relationship between the deposition mechanism and film composition during the chemical vapor deposition. Various thin metal oxide films will be prepared by chemical vapor deposition and atomic layer chemical vapor deposition under this program and these amorphous high dielectric materials may be used for the fabrication of thin films with tunable electronic and photonic properties. In addition, the research program will provide a rich multidisciplinary education and training opportunity to students in material chemistry.