课题基金 / 基金详情

Acquisition of a Sputter Deposition System for Thin Films Research and Education

Acquisition of a Sputter Deposition System for Thin Films Research and Education
采购用于薄膜研究和教育的溅射沉积系统
批准号:
0215902
负责人:
Joost Vlassak
金额:
$16.3万
依托单位:
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2002
资助国家:
美国
项目状态:
已结题
起止时间:
2002-08-15 至 2004-07-31

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中文摘要
翻译
材料研究计划仪器的这一奖项将支持哈佛大学应用物理和应用力学小组的教师购买带有原位应力监测器的薄膜沉积系统。该系统将用于生长厚度从几十纳米到几微米的金属薄膜,以全面研究薄膜的机械性能。本研究的主要焦点是元素金属和合金薄膜的变形行为。基本的变形机制和相互作用的微观结构特征,如晶粒尺寸,晶粒取向,晶界,界面,表面和位错亚结构将被探讨。合金薄膜将用于研究薄膜中的沉淀硬化和形状记忆效应。该沉积系统还将支持自组织纳米结构演化和非晶金属薄膜的研究。IMR项目的这一奖项将支持哈佛大学工程与应用科学系应用物理和应用力学组的教师购买带有原位应力监测器的薄膜沉积系统。该系统将用于薄膜力学,自组织纳米结构演化和非晶金属薄膜的研究生研究项目。除了研究生研究计划外,还将设立一个特别计划,让本科生在该部门提供的独立研究课程框架内参与原创薄膜研究。沉积系统还将通过为材料科学入门课程开发特殊的实验室课程来显着推进本科教育。这些课程将作为薄膜技术的第一次介绍,但也旨在培养对先进材料工程研究的兴趣。
英文摘要
This award from the Instrumentation for Materials Research Program will support faculty in the Applied Physics and Applied Mechanics groups at Harvard University with the acquisition of a thin film deposition system with in-situ stress monitor. The system will be used for the growth of metal films that range in thickness from tens of nanometers to several micrometers, for a comprehensive study of thin film mechanical properties. The main focus of this study is the deformation behavior of elemental metal and alloy films. Basic deformation mechanisms and interactions with microstructural features such as grain size, grain orientation, grain boundaries, interfaces, surfaces, and dislocation substructure will be explored. Alloy films will be used to investigate precipitation hardening and the shape memory effect in thin films. The deposition system will also support research on self-organized nanostructure evolution and amorphous metallic films. Students at the undergraduate, graduate, and postdoctoral levels will use the system.This award from the IMR Program will support faculty in the Applied Physics and Applied Mechanics groups in the Division of Engineering and Applied Sciences at Harvard University with the acquisition of a thin film deposition system with in-situ stress monitor. The system will be used in graduate research projects on thin film mechanics, self-organized nanostructure evolution, and amorphous metallic films. In addition to the graduate research program, a special program will be set up to involve undergraduate students in original thin films research in the framework of an independent research course offered by the Division. The deposition system will also significantly advance undergraduate education through the development of special laboratory sessions for an Introductory Materials Science course. These sessions will serve as a first introduction to thin film technology, but are also intended to foster interest in advanced Materials Engineering studies.
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I-Corps: Photophoretically levitating platforms for atmospheric sensing and communications
  • 批准号:
    2345244
  • 项目类别:
    Standard Grant
  • 资助金额:
    $5.0万
  • 财政年份:
    2023
  • 负责人:
    Joost Vlassak
  • 依托单位:
Rational development of next-generation shape memory alloys
  • 批准号:
    1808162
  • 项目类别:
    Standard Grant
  • 资助金额:
    $43.35万
  • 财政年份:
    2018
  • 负责人:
    Joost Vlassak
  • 依托单位:
Stretchable, Tough, Water-Retaining Hydrogels for Non-Traditional Applications
  • 批准号:
    1404653
  • 项目类别:
    Standard Grant
  • 资助金额:
    $40.0万
  • 财政年份:
    2014
  • 负责人:
    Joost Vlassak
  • 依托单位:
DMREF/GOALI/Collaborative Research: High-Throughput Simulations and Experiments to Develop Metallic Glasses
  • 批准号:
    1435820
  • 项目类别:
    Standard Grant
  • 资助金额:
    $40.0万
  • 财政年份:
    2014
  • 负责人:
    Joost Vlassak
  • 依托单位:
海外基金