Growth of Ultra Thin Films
Growth of Ultra Thin Films
批准号:
0553839
负责人:
John Ekerdt
金额:
$22.06万
依托单位国家:
美国
项目类别:
Standard Grant
财政年份:
2006
资助国家:
美国
项目状态:
已结题
起止时间:
2006-06-01 至 2009-05-31
中文摘要
项目编号:0553839题目:超薄薄膜的生长本研究项目旨在研究超薄(小于9纳米)金属薄膜在非晶基底上的生长。将研究化学生长方法,包括化学气相沉积、原子层沉积和等离子体增强化学气相沉积。金属薄膜在传感器、光学和微电子领域有广泛的应用,随着应用和系统的关键尺寸或尺寸的减小,金属薄膜的厚度也必须减小到至多几十个原子直径,并且必须具有特定的微观结构。研究将集中在化学和物理方法上,以增加衬底对金属前驱体的反应性,以增加簇的密度,从而生长成连续的薄膜。研究还将集中在添加剂的作用上,添加剂有可能与金属形成热力学稳定的化合物,形成稀释的非晶合金,这将干扰多晶薄膜的形成。钴、镍、钌、铼和铱金属将与碳、氮、硅和磷合金添加剂一起研究。研究的目的是了解使反应和过程,这将导致最薄的连续薄膜,并具有非晶特性的超薄薄膜。工作计划将涉及薄膜生长和表征研究,并将涉及表面研究,以阐明当配体和底物被修饰时前体如何与底物相互作用。这项研究利用了德克萨斯大学的专业知识和实验基础设施来生长和表征薄膜,并研究表面反应。使用表面科学的工具,键和反应在衬底表面和薄膜界面将被探索。利用x射线光电子能谱、二次离子质谱和低能离子散射能谱跟踪薄膜的组成和化学键。完整的表征设备将用于研究薄膜,包括光谱椭偏仪、原子力显微镜、x射线散射光谱和高分辨率电子显微镜。更广泛的影响这项研究的动机一般是由于非晶基板上的薄和超薄金属薄膜在传感器和光学等应用中的关键作用,作为热障,以及微电子制造中的扩散屏障,这可能对美国经济产生积极影响。本研究将直接支持两名研究生的培养,并间接为本科生提供参与开放式研究项目的机会。研究生将通过与本科生一起工作来培养指导技能。PI和研究生将开发一个展览,帮助解释推动这项研究的革命性和当前设备,传感器和微电子,并向公众和大学预科学生介绍这些概念。他们将通过德州大学赞助的各种场所来展示它,比如一年一度的奥斯汀科学趣味日、德州大学开放日和德州纪念博物馆。
英文摘要
ABSTRACTPI: John G. Ekerdt Institution: University of Texas AustinProposal Number: 0553839Title: Growth of Ultra Thin FilmsIntellectual Merit This research program investigates the growth of ultra thin (less than 9 nm) metal films on amorphous substrates. Chemical growth methods will be studied and include chemical vapor deposition, atomic layer deposition and plasma-enhanced chemical vapor deposition. Metal films find applications in sensors, optics and microelectronics, and as the critical dimensions or size of the applications and systems decrease, the metal films thickness also must decrease to tens of atomic diameters at most and must have a specific microstructure. The research will focus on chemical and physical methods to increase the reactivity of the substrate toward the metal precursor to increase the density of clusters that grow into a continuous film. The research will also focus on the role of additives, with the potential to form thermodynamically stable compounds with the metals, to form dilute amorphous alloys that will interfere with the formation of polycrystalline films. Cobalt, nickel, ruthenium, rhenium and iridium metals will be studied along with carbon, nitrogen, silicon and phosphorus alloying additives. The research objectives are an understanding of the enabling reactions and processes that will lead to the thinnest possible continuous film, and to an ultra thin film with amorphous character. The program of work will involve film growth and characterization studies and it will involve surface studies to elucidate how the precursors interact with the substrates as the ligands and substrates are modified. The research leverages the expertise and experimental infrastructure at the University of Texas to grow and characterize films and to study surface reactions. Using the tools of surface science, the bonding and reactions at the substrate surface and at the film interface will be explored. Film composition and chemical bonding will be followed using X-ray photoelectron spectroscopy, secondary ion mass spectrometry and low energy ion scattering spectroscopy. A full complement of characterization facilities will be used to study the films, including spectral ellipsometry, atomic force microscopy, X-ray scattering spectroscopy, and high resolution electron microscopy.Broader ImpactsThis research is motivated in general by the key role thin and ultra thin metal films on amorphous substrates have in applications such as sensors and optics, as thermal barriers, and as diffusion barriers in microelectronics manufacturing, which could have a positive effect on the US economy.The research will directly support the training of two graduate students and indirectly provide opportunities for undergraduates to participate in open-ended research projects. The graduate students will develop mentoring skills through working with the undergraduate students. The PI and the graduate students will develop an exhibit that will help explain the revolutionary and current devices that motivate this research, sensors and microelectronics, and introduce these concepts to the general public and to pre-college students. They will present it and display it through a variety of University of Texas sponsored venues, such as the annual Austin Science Fun Day, UT Open House, and the Texas Memorial Museum.
期刊论文(0)
专著(0)
科研奖励(0)
会议论文
Chemical Routes to the Growth of Crystalline Functional Oxides on Germanium
-
批准号:1728656
-
项目类别:Standard Grant
-
资助金额:$36.12万
-
财政年份:2017
-
负责人:John Ekerdt
-
依托单位:
GOALI: Zintl Engineering of Epitaxial Ceramic Films on Gallium Nitride
-
批准号:1507970
-
项目类别:Continuing Grant
-
资助金额:$64.0万
-
财政年份:2015
-
负责人:John Ekerdt
-
依托单位:
Chemical Routes to the Growth of Crystalline Oxides Directly on Germanium for Applications in Future Generation Microelectronic Devices
-
批准号:1437050
-
项目类别:Standard Grant
-
资助金额:$31.48万
-
财政年份:2014
-
负责人:John Ekerdt
-
依托单位:
Nucleation and Growth of Thin Films and Nanostructures
-
批准号:1160195
-
项目类别:Continuing Grant
-
资助金额:$30.54万
-
财政年份:2012
-
负责人:John Ekerdt
-
依托单位:
GOALI: Negative Capacitance in Epitaxial Oxide Heterostructures
-
批准号:1207342
-
项目类别:Continuing Grant
-
资助金额:$48.0万
-
财政年份:2012
-
负责人:John Ekerdt
-
依托单位:
GOALI/FRG: Epitaxial Growth of Perovskite Films and Heterostructures by Atomic Layer Deposition and Molecular Beam Epitaxy
-
批准号:1006725
-
项目类别:Continuing Grant
-
资助金额:$51.55万
-
财政年份:2010
-
负责人:John Ekerdt
-
依托单位:
Growth of Ultra Thin Metal Alloy Films
-
批准号:0854345
-
项目类别:Standard Grant
-
资助金额:$35.0万
-
财政年份:2009
-
负责人:John Ekerdt
-
依托单位:
SGER - Fundamental Understanding of Catalytic Cleavage of Lignin in Ionic Liquids
-
批准号:0849342
-
项目类别:Standard Grant
-
资助金额:$0.0万
-
财政年份:2008
-
负责人:John Ekerdt
-
依托单位:
Materials World Network: Design, Growth, and Properties of Boron-based Thin Films for Electronics and Nanosized Electronics
-
批准号:0603004
-
项目类别:Continuing Grant
-
资助金额:$38.4万
-
财政年份:2006
-
负责人:John Ekerdt
-
依托单位:
Hydrocarbon Surface Reactions Over Transition Metals
-
批准号:8700876
-
项目类别:Continuing Grant
-
资助金额:$12.63万
-
财政年份:1987
-
负责人:John Ekerdt
-
依托单位:
Hydrocarbon Surface Reactions Over 3-D Metals
-
批准号:8319494
-
项目类别:Continuing Grant
-
资助金额:$15.51万
-
财政年份:1984
-
负责人:John Ekerdt
-
依托单位:
Research Initiation - Characterization of Ligand-Bound Transition Metal Complexes: Effects of the Physical Environment on Catalyst Performance
-
批准号:8006720
-
项目类别:Standard Grant
-
资助金额:$4.0万
-
财政年份:1980
-
负责人:John Ekerdt
-
依托单位:
Specialized Research Equipment: Studies of Catalytic Mechanisms Through the Use of Transient Response Measurements
-
批准号:7923609
-
项目类别:Standard Grant
-
资助金额:$1.8万
-
财政年份:1980
-
负责人:John Ekerdt
-
依托单位:
国内基金
海外基金
磷脂酶Ultra特异性催化油脂体系中微量磷脂分子的调控机制研究
-
批准号:31471690
-
项目类别:面上项目
-
资助金额:90.0万元
-
批准年份:2014
-
负责人:王永华
-
依托单位:
适应纳米尺度CMOS集成电路DFM的ULTRA模型完善和偏差模拟技术研究
-
批准号:60976066
-
项目类别:面上项目
-
资助金额:41.0万元
-
批准年份:2009
-
负责人:何进
-
依托单位: