Method Development for Measuring Procedures for the In-Process-Characterisation of Sub-100-nm-Structures

微技术和纳米技术属于最具增长前景的经济领域。近年来，特别是在涂层技术领域，越来越多的应用正在走向大规模生产。然而，最大的挑战之一是实现适当的过程控制。因此，对合适的过程测量程序的需求不断上升。理论检验表明，散射光分布主要包含了被照射表面现有纳米结构的信息。由于快速、集成和非接触式的数据采集，散射光测量方法注定了纳米结构系统的过程测量。不幸的是，逆问题不容易解决，因为不可能追溯到底层结构或处理与测量散射光分布的偏差。在DFG优先程序SPP1327中研究了通过严格的光散射模拟来解决这个问题的第一种方法。目前的研究结果表明，基于模拟的散射光测量方法的开发基本上是可能的。该项目的目的是实现一种方法，用于开发基于散射光的任意纳米结构表面的过程测量程序。这一方法将从三个技术应用的结果中得出。在研究经费的第一年，将在前期研究的基础上实现全局随机缺陷的过程测量程序。通过该系统收集的知识将作为开发方法的基础。在第二年，对局部发生的缺陷的计划特征描述与实际较高的度量工作相关。最后考虑的确定性缺陷代表了两个领域的最大挑战：技术实现和知识集成到方法中。表面粗糙度引起的随机效应占主导地位，因此散射光分布没有明显的偏差。因此，对测量技术和算法的要求要高得多。

Microtechnology and nanotechnology belong to the economic areas with the highest growth forecasts. In recent times, particularly in the area of the coating technologies, an increasing number of applications are on route to mass production. However, one of the largest remaining challenges is the realisation of an adequate process control. From this fact a rising demand for suitable in-process measuring procedures results. Theoretical examinations show that scattered light distributions principally contain information about existing nanostructures of the illuminated surfaces. Due to the fast, integral and contactless data acquisition, scattered light measuring procedures are predestined for in-process measurements of nanostructured systems. Unfortunately, the inverse problem cannot easily be solved because it is not possible to trace back to the underlying structures or to process deviations from the measured scattered light distributions. A first approach to solve this problem by rigorous light scattering simulations was examined in the DFG Priority Program SPP1327. Current research results show that the development of scattered light measuring procedures based on simulations is principally possible.The aim of this project is the realisation of a methodology for the development of scattered-light-based in-process measuring procedures for arbitrary nanostructured surfaces. This methodology shall result from the findings from three technical applications. In the first year of the research funding, an in-process measuring procedure for global stochastic defects is to be realized which is based on the preliminary investigations. The knowledge gathered with this system will be used as base for the development of the methodology. In the second year the planned characterisation of local occurring defects is related with a substantially higher measuring effort. The finally regarded deterministic defects represent the largest challenge in both areas: the technical realisation and the knowledge integration into the methodology. Stochastic effects induced by the surface roughness dominate, therefore there are no obvious deviations to be expected in the scattered light distributions. Thus the requirements to the measuring technique and also to the algorithms are substantially higher.