Evaluation of Mechanical and Electrical Properties of Diamond Synthesized from Gas Phase

用YAG激光对电弧放电等离子体喷射CVD法合成的金刚石膜进行了切割和刨削。结果，通过控制能量密度，CVD金刚石的切割是可能的。对于CVD金刚石在氧气中的刻蚀，无定形碳、晶界和晶粒中的缺陷优先被蒸发，然后金刚石颗粒被氧化。在切割的情况下，金刚石通过氧气中的氧化和汽化或通过氩气中的石墨化而被去除。因此，通过在氧气中的激光照射，在没有石墨沉积的情况下使清晰的横截面粒化。此外，通过控制入射角，表面刨削是可能的。平行入射激光对金刚石薄膜进行刨削后，金刚石表面的粗糙度最大可达3 μ m。研究表明，利用热化学反应可以对金刚石薄膜进行抛光。金刚石膜抛光的最佳条件 ...更多信息 单热金属板是通过实验确定的。尽管微波等离子体化学气相沉积法沉积的金刚石薄膜与衬底表面的连接并不牢固，但在较低的施加压力和较低的旋转速度下，可以用热金属将金刚石薄膜抛光光滑而不剥落衬底。通过改变抛光板材料、抛光温度、抛光气氛、抛光压力和旋转速度，研究了抛光条件对抛光速率的影响。作为最佳抛光条件，在真空中，在950 ℃下，使用铁抛光板，施加压力40 kPa，旋转速度7 mm/s，抛光7 × 7 mm的金刚石膜，表面Rmax为2.5 μ m，时间为15分钟。为了评价金刚石薄膜的韧性，在陶瓷和PCD基体上进行了金刚石涂层的实验。并以这些沉积物为切削工具，对铝硅合金进行了车削加工。虽然观察到少量的剥离陶瓷子开始金刚石膜没有磨损，即使在5452米的切割距离。结果表明，金刚石薄膜具有良好的耐磨性。少

YAG laser cutting and planing of diamond films synthesized by arc discharge plasma jet CVD have been described. As a result, by controlling the energy density, cutting of a CVD diamond is possible. As for etching of CVD diamond in oxygen gas, preferentially amorphous carbon, grain boundary and fault in grain are vaporized and then diamond grains are oxidized. In the case of cutting, diamonds are removed by oxidization and Vaporization in the oxygen gas or by graphitization in the argon gas. Therefore by laser irradiation in the oxygen gas, clear cross sections were grained without graphite deposition. Moreover by controlling the incident angle, the surface planing is possible. The roughness of diamonds surface after planing by parallel incident laser beam was about 3um Rmax.Polishing is a essential technique to apply diamond films to industrial uses. It has been cleared that diamond film can be polished by using thermochemical reaction. The optimum condition of diamond film polishing u … More sing hot metallic plates is determined experimentally. Although diamond films deposited by microwave plasma CVD are not firmly connected to the surface of substrates, under low applied pressure and slow spinning speeds, diamond film can be polished smooth without peeling off the substrate by using hot metals. In this study, the effects of polishing conditions on polishing rate are xamined by changing the polishing plate materials, temperatures, atmospheric gases, applied pressures and spinning speeds. As an optimum polishing condition, a 7x7 mm diamond film with a surface of 2.5um Rmax is polished at 950C in vacuum for 15 minutes, using an iron polishing plate under an applied pressure 40kPa and a spinning speed 7mm/s. A smoothly polished surface of 2.5nm Ra is obtained.In order to estimate the toughness of diamond films, diamond coating on a ceramic and a PCD substrate were carried out. And by using these deposits as cutting tools, Al-Si alloys were turned. Though small peeling-off was observed on a ceramic substart diamond films did not wear even if 5452m of the cutting distance. It shows that the diamond films have good wear-resistance. Less