Photoelectron emission of MgO Thin Films with Co NanoparticlesDeposited Using Arc Plasma Gun

利用弧等离子体枪(APG)以岛状图案在衬底上沉积了CO纳米粒子。然后，通过金属有机分解(MOD)在该衬底上形成了一层氧化镁薄膜，从而在大气中形成了薄膜，从而形成了双层结构。在500次脉冲弧光放电条件下，用APG在Co纳米颗粒上沉积的MgO薄膜结晶度提高，光电子发射性能至少提高了3倍以上。在500次弧光放电下在硅衬底上沉积Co纳米粒子所形成的样品的透过率虽然在30%以下，但在衬底上形成了一层MgO薄膜，并且在900℃的热处理过程中Co纳米粒子在薄膜中弥散开来，透过率提高到90%以上，从而获得了高透明度的薄膜。

Co nanoparticles were deposited on a substrate in an island pattern using an arc plasma gun (APG). Then, a MgO thin film was formed on this substrate by metal organic decomposition (MOD), which enables the formation of films in atmosphere, thus yielding a double-layer structure. The MgO thin film on Co nanoparticles deposited using the APG with 500 pulses of arc discharge exhibited improved crystallinity and a photoelectron emission that was at least threefold higher than that of the MgO thin film without Co nanoparticles. Although the transmittance of the specimen, formed by depositing Co nanoparticles on a Si substrate with 500 pulses of arc discharge, was 30% or lower, it increased to higher than 90% after the formation of a MgO thin film on the substrate and the dispersion of the Co nanoparticles within the MgO thin film during heat treatment at 900 °C. Thus, a highly transparent film was obtained.