Standard NbN and NbTiN films prepared by nitrogen implantation for process characterization and optimization
Standard NbN and NbTiN films prepared by nitrogen implantation for process characterization and optimization
批准号:
521752-2017
负责人:
Rosei, Federico
金额:
$1.82万
依托单位国家:
加拿大
项目类别:
Engage Grants Program
财政年份:
2017
资助国家:
加拿大
项目状态:
已结题
起止时间:
2017-01-01 至 2018-12-31
中文摘要
该项目为期6个月,旨在通过氮离子注入在蓝宝石衬底上制备100- 200nm厚度的标准NbN和NbTiN薄膜,并将其物理性能与溅射沉积制备的类似薄膜进行比较,以进行质量控制和工艺优化。对于我们的工业合作伙伴埃斯特姆工程公司来说,这些特性解决了一个至关重要的问题,埃斯特姆工程公司开发了先进的沉积系统,并实施了与传感技术、超导电子设备和纳米材料工程相关的基础和应用研究的制造工艺。公司将提供经N+离子注入并在INRS下退火的纯沉积nb和NbTi薄膜,以及使用Angstrom商用仪器在不同沉积参数下合成的NbN和NbTi样品。将设置注入氮离子的能量和剂量,以便在不同样品之间进行相关比较,使用蒙特卡罗模拟支持先进的表征工具,如SE, SEM, EDX,拉曼和XRD分析。然后在低温下研究溅射沉积和离子注入制备的NbN和NbTiN薄膜,以测量它们的电阻率和临界温度。我们的研究将主要在montrsamal地区进行,那里有离子注入和高级表征的设施。为了实现我们的目标,其中包括处理几个离子植入原型,作为公司的参考样本,并扩展Angstrom科学人员的专业知识和专业知识,在整个项目期间,Rosei教授将由一名研究助理协助。预期的影响将导致对铌基超导薄膜及其合成的进一步了解,为未来无损计量、先进制造和材料工程领域的工作提供帮助。
英文摘要
This six month project aims to achieve standard NbN and NbTiN thin films of 100-200 nm thickness onsapphire substrates using nitrogen ion implantation, and compare their physical properties to similar filmsprepared by sputter deposition for quality control and process optimization. These features address a problemof critical importance for Angstrom Engineering Inc., our industrial partner, who develops advanced depositionsystems and implements fabrication processes for basic and applied research, related to sensing technology,superconductive electronic devices and nanomaterials engineering. The company will provide pure depositedNb and NbTi films that will be implanted by N+ ion and annealed at INRS, as well as NbN and NbTiNsamples synthesized under different deposition parameters using Angstrom's commercial instruments. Theenergy and dose of implanted nitrogen ions will be set to enable a relevant comparison between the differentsamples, using Monte-Carlo simulations supported by advanced characterization tools, such as SE, SEM, EDX,Raman, and XRD analyses. Both NbN and NbTiN films prepared by sputter deposition and processed by ionimplantation will be then investigated at low-temperatures, to measurement their electrical resistivity andcritical temperatures. Our research will be mainly conducted in the Montréal Area, where facilities for ionimplantation and advanced characterization are available. To achieve our objectives, which include theprocessing of several ion-implanted prototypes to be used as reference specimens by the company and extendboth the know-how and the expertise of Angstrom's scientific staff, Prof. Rosei will be assisted by a researchassociate during the whole duration of the project. The expected impact will result in advancing knowledge onNb-based superconductive films and their synthesis, for future work in the areas of non-destructive metrology,advanced manufacturing and materials engineering.
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