Theoretical Studies of Etching and Growth Dynamics at Surfaces

这个项目是在一般地区的分析和表面 化学和界面过程理论的子领域。 在这三年的持续资助任期内，教授 加里森和她的学生将运用分子动力学技术 了解地表过程的三个重要领域， 即半导体的分子束外延生长， 氟对硅表面的腐蚀， 高能（KeV）粒子与固体表面。 这项研究， 它建立在加里森教授在国家科学基金会的成就之上， 赠款CHE-8713796，代表了重要的实际应用 从理论到复杂的，现实世界的问题， 重要性 配合最先进的实验研究 在合作者的实验室里，教授 加里森的研究提供了一个独特的框架， 评价的理论结构和理论上 指导实验的执行。 此外，该项目 为培养青年理论家提供了独特的环境 谁将有能力解决具有挑战性的问题， 材料化学 这项研究对技术上重要的 微电子制造、材料加工和 表面分析

This project is in the general area of analytical and surface chemistry and in the subfield of theory of interfacial processes. During the tenure of this three-year continuing grant, Professor Garrison and her students will apply molecular dynamics techniques to an understanding of three important areas of surface processes, namely the molecular beam epitaxial growth of semiconductors, the etching of silicon surfaces by fluorine, and the interaction of energetic (KeV) particles with solid surfaces. This research, which builds on Professor Garrison's accomplishments under NSF grant CHE-8713796, represents significant practical applications of theory to complex, real-world problems of immense technological importance. In concert with state-of-the-art experimental studies of these systems in the laboratories of collaborators, Professor Garrison's research provides a unique framework both for the evaluation of theoretical constructs and for the theoretically guided execution of experiments. Additionally, this project offers a unique environment for the training of young theorists who will be well-equipped to address challenging problems in materials chemistry. This research impacts broadly on the technologically important areas of microelectronics fabrication, materials processing, and surface analysis.